2014 IEEE 27th International Conference on Micro Electro Mechanical Systems (MEMS) 2014
DOI: 10.1109/memsys.2014.6765595
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Near infrared photo-detector using self-assembled formation of organic crystalline nanopillar arrays

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Cited by 3 publications
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“…Among the various nanopillar arrays, silicon nanopillars have been widely investigated because silicon is an important material in optical and optoelectronic devices, moreover, they can be fabricated with existing silicon processing methods and with low cost. 12 There are many techniques to fabricate nanopillar arrays, such as photolithography with etching, 13 nanoimprinting lithography (NIL), 14,15 anodic aluminum oxide (AAO) patterning, 16,17 self-assembled particles, 18 laser direct writing 8 and so on. These methods have fabricated the nanopillar arrays with high aspect ratio, large area, or low fabrication cost.…”
Section: Introductionmentioning
confidence: 99%
“…Among the various nanopillar arrays, silicon nanopillars have been widely investigated because silicon is an important material in optical and optoelectronic devices, moreover, they can be fabricated with existing silicon processing methods and with low cost. 12 There are many techniques to fabricate nanopillar arrays, such as photolithography with etching, 13 nanoimprinting lithography (NIL), 14,15 anodic aluminum oxide (AAO) patterning, 16,17 self-assembled particles, 18 laser direct writing 8 and so on. These methods have fabricated the nanopillar arrays with high aspect ratio, large area, or low fabrication cost.…”
Section: Introductionmentioning
confidence: 99%