Negative‐Tone Block Copolymer Lithography by In Situ Surface Chemical Modification

Kim, Bong Hoon; Byeon, Kyeong Jae; Kim, Ju Young; Kim, Jinseung; Jin, Hyeong Min; Cho, Joong Yeon; Jeong, Seong Jun; Shin, Jisoo; Lee, Heon; Kim, Sang Ouk

doi:10.1002/smll.201400971

Cited by 6 publications

(4 citation statements)

References 50 publications

(82 reference statements)

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“…In this case, on top of the guiding stripe, the BCP presents a parallel oriented configuration, and on top of the background stripes, the polymer is oriented orthogonal to the direction of the guiding pattern. Similar patterns have been shown before. ,,− This morphology resembles the simulation result in Figure a, indicating that it corresponds to a very strong preference of the guiding pattern. In our model of a random copolymer brush, the segments of the brush and the copolymer are structurally identical, and Figure b already employs the maximal preference of the guiding stripes within the random copolymer brush model.…”

Section: Resultssupporting

confidence: 85%

“…Similar patterns have been shown before. 19,22,[57][58][59] This morphology resembles the simulation result in Figure 3.a, indicating that it corresponds to a too strong preference of the guiding pattern. In our model of a random copolymer brush, the segments of the brush and the copolymer are structurally identical and Figure 3.b already employs the maximal preference of the guiding stripes within the random copolymer brush model.…”

Section: D) Simulationssupporting

confidence: 69%

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Role of Penetrability into a Brush-Coated Surface in Directed Self-Assembly of Block Copolymers

Evangelio

Fernández-Regúlez

Fraxedas

et al. 2018

ACS Appl. Mater. Interfaces

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High density and high resolution line and space patterns on surfaces are obtained by directed selfassembly of lamella-forming block copolymers using wide-stripes chemical guiding patterns. When the width of the chemical pattern is larger than the half-pitch of the block copolymer, the interaction energy between each block copolymer domain and the surface is crucial to obtain the desired segregated film morphology. We investigate how the intermixing between block copolymers and polymer brush molecules at the surface influences the optimal surface and interface free energies to obtain a proper block copolymer alignment. We have found that computational models successfully predict the experimentally obtained guided patterns if the penetrability of the brush layer is taken into account instead of a hard, impenetrable surface. Experiments on directed self-assembly of lamella-forming PS-b-PMMA using chemical guiding patterns corroborate the models used in the simulations, where the values of the surface free energy between block copolymer and guiding and background stripes are accurately determined using an experimental method based on the characterization of contact angles in droplets formed after dewetting of homopolymer blends.to one of them, respectively. Therefore, a proper wetting balance of the polymer blocks to the substrate is needed to promote lamellae oriented perpendicular to the substrate. The most common way to control the orientation of the BCP micro-domains consists in using neutral surfaces to control the surface free energy, so that the difference in the surface interaction of the two blocks is small.. 9Thin films of vertical lamellae form patterns whose morphology is randomly oriented; the width of the lines being defined by the molecular weight of the BCP. Nevertheless, ordered arrays of lines with a predefined orientation and registered with respect to device boundaries are required for most of technological applications, not only for high volume manufacturing, but also as a general method to realize templates for anisotropic metal nanostructures 10 . This can be achieved by pre-structuring the substrate with guiding patterns of appropriate dimensions and shape. These guiding patterns are realized by grapho-or chemoepitaxy methods. In graphoepitaxy, [11][12][13] the guiding patterns are made of topographical features. Usually, the width of the trench becomes a limitation for achieving high density of integration. [14][15][16] Therefore, in order to avoid this limitation, chemical epitaxy methods have been intensively explored to produce highly dense patterns. 3,[17][18][19] Moreover, in chemical epitaxy there is a reduction of the edge roughness due to the self-healing of the BCP, which means that the irregularities of the guiding patterns are not transferred to the BCP pattern. 20 Chemical guiding patterns are fabricated by conventional topdown lithographic methods like optical, extreme ultraviolet (EUV) projection or electron beam lithography (EBL), in combination with a selective, local chemical...

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Section: Resultssupporting

confidence: 85%

Section: D) Simulationssupporting

confidence: 69%

Role of Penetrability into a Brush-Coated Surface in Directed Self-Assembly of Block Copolymers

Evangelio

Fernández-Regúlez

Fraxedas

et al. 2018

ACS Appl. Mater. Interfaces

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“…Nonetheless, in order to fabricate novel and rather unique patterns of very specific dimensions [219,266,267] over a large area [223,266], as required by many state-of-the-art applications that include optical nanoresonators [268], nanoelectronic elements [269], bioreceptors [21], transistors [270], and others [271][272][273], it is necessary to further combine top-down and bottomup methodologies [28,205,268,269,274,275]. As a result, peculiar surface relief patterns down to the 10 nm scale [219,266,267] can be obtained through combinations of BCPL with NIL [28,205,268,269,275,276], of BCPL with EBL [270,273,277,278], of BCPL with photolithography [223,266,272], of DNA self-assembly with IBL [21], etc. Examples of the resulting surface relief patterns include 8 nm wide lines of PS-b-PDMS self-assembled in both straight and circular trenches [219] (Figure 13a), 10 nm PDMS spheres assembled in trenches [267], trenches with irregular features or trenches with the shape of jogs of various depths and lateral widths [273], dot-patterned domains of various heights spaced by patternless trenches of various lateral widths…”

Section: Patterning Through the Combination Of Bottom-up And Top-down Methodologiesmentioning

confidence: 99%

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

Handrea-Dragan

Botiz

2021

Polymers

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There is an astonishing number of optoelectronic, photonic, biological, sensing, or storage media devices, just to name a few, that rely on a variety of extraordinary periodic surface relief miniaturized patterns fabricated on polymer-covered rigid or flexible substrates. Even more extraordinary is that these surface relief patterns can be further filled, in a more or less ordered fashion, with various functional nanomaterials and thus can lead to the realization of more complex structured architectures. These architectures can serve as multifunctional platforms for the design and the development of a multitude of novel, better performing nanotechnological applications. In this work, we aim to provide an extensive overview on how multifunctional structured platforms can be fabricated by outlining not only the main polymer patterning methodologies but also by emphasizing various deposition methods that can guide different structures of functional nanomaterials into periodic surface relief patterns. Our aim is to provide the readers with a toolbox of the most suitable patterning and deposition methodologies that could be easily identified and further combined when the fabrication of novel structured platforms exhibiting interesting properties is targeted.

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“…Subsequently, silicon oxide wafer was sufficiently oxygen plasma treated in vacuum chamber. This process removed most of the impurities on the substrate and provided a highly dense hydroxyl group (-OH) on silicon oxide wafer ( Figure 1a) [31,32].…”

Section: Fabrication Of Paritally Suspended G-fets 221 Pre-treatmementioning

confidence: 99%

High Performance Field-Effect Transistors Based on Partially Suspended 2D Materials via Block Copolymer Lithography

et al. 2021

Self Cite

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Although various two-dimensional (2D) materials hold great promise in next generation electronic devices, there are many challenges to overcome to be used in practical applications. One of them is the substrate effect, which directly affects the device performance. The large interfacial area and interaction between 2D materials and substrate significantly deteriorate the device performance. Several top-down approaches have been suggested to solve the problem. Unfortunately, however, they have some drawbacks such as a complicated fabrication process, a high production cost, or a poor mechanical property. Here, we suggest the partially suspended 2D materials-based field-effect transistors (FETs) by introducing block copolymer (BCP) lithography to fabricate the substrate effect-free 2D electronic devices. A wide range of nanometer size holes (diameter = 31~43 nm) is successfully realized with a BCP self-assembly nanopatterning process. With this approach, the interaction mechanism between active 2D materials and substrate is elucidated by precisely measuring the device performance at varied feature size. Our strategy can be widely applied to fabricate 2D materials-based high performance electronic, optoelectronic, and energy devices using a versatile self-assembly nanopatterning process.

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Negative‐Tone Block Copolymer Lithography by In Situ Surface Chemical Modification

Cited by 6 publications

References 50 publications

Role of Penetrability into a Brush-Coated Surface in Directed Self-Assembly of Block Copolymers

Role of Penetrability into a Brush-Coated Surface in Directed Self-Assembly of Block Copolymers

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

High Performance Field-Effect Transistors Based on Partially Suspended 2D Materials via Block Copolymer Lithography

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