New experiments on the electrodeposition of iron in porous silicon

Renaux, Christian; Scheuren, V.; Flandre, Denis

doi:10.1016/s0026-2714(99)00331-5

Cited by 21 publications

(10 citation statements)

References 9 publications

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“…1 Dealing with the introduction of metals into the pores, [2][3][4][5][6][7][8][9][10][11][12][13][14] special attention was paid to the realization of deep electrical contact with the pore walls to improve the electroluminescence efficiency. 1 Dealing with the introduction of metals into the pores, [2][3][4][5][6][7][8][9][10][11][12][13][14] special attention was paid to the realization of deep electrical contact with the pore walls to improve the electroluminescence efficiency.…”

Section: Introductionmentioning

confidence: 99%

“…[4][5][6]8 The substitution of easily broken Si-H bonds with solid metal-Si ones has also been of concern to stabilize the luminescence properties of this material. 2,10 For the commonly used templates, i.e. Indeed, the introduction of ferromagnetic iron-group metals in a such PS structure would lead to new potential systems for magnetic memory, storage disk, and microwave applications.…”

Section: Introductionmentioning

confidence: 99%

“…Indeed, the introduction of ferromagnetic iron-group metals in a such PS structure would lead to new potential systems for magnetic memory, storage disk, and microwave applications. 2 Furthermore, the achievement of a suitable metallization of PS with iron or other metals to fabricate buried conductive and semiconductive silicide layers inside singlecrystal silicon always remains an open topic. track-etched polymer membranes and porous alumina, the fabrication and properties of arrays of magnetic nanowires and multilayers have aroused a considerable interest during the last decade.…”

Section: Introductionmentioning

confidence: 99%

“…1,4,6,8 However, scattered results were obtained regarding the in-depth profile concentration of the electrodeposited metals. 2 They concluded that iron nucleation occurs all over the pore walls, resulting in a quick pinching of the pores. It is believed, however, that the nature of the metal and the type of silicon doping seem to be the more determinant parameters.…”

Section: Introductionmentioning

confidence: 99%

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Electrodeposition of Fe–Co Alloys into Nanoporous p-type Silicon: Influence of the Electrolyte Composition

et al. 2002

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The cathodic deposition of iron-cobalt alloys inside the pores of anodically formed nanoporous silicon (PS) from p-type Si substrate is investigated with respect to the electrolyte composition. The samples were characterized by scanning electron microscopy, energy dispersive spectrometry, Auger electron spectroscopy, and Fourier transform infrared spectroscopy. Results showed that the nucleation of pure cobalt started at the bottom of the pores and the nucleation of pure iron occurred all over the pore walls, leading to a preferential deposition on top surface of the porous layer. Nevertheless, a low concentration of Co 2+ ions (5 at.%) in the electrolyte drastically improved the penetration of iron into the pores. As a result, a good filling of the pores with Co metal as well as with Fe-Co alloys was achieved. It was also shown that the deposition process oxidizes the structure mainly at the pore walls. The results of our investigation indicate that the mechanisms occurring during the electrodeposition of metals on porous p-type silicon substrates are completely different depending on the kind of electrolyte used: pure iron-based electrolyte or cobalt-based solutions. A complete understanding of the deposition process requires further analyses of the carrier transport in PS and of the charge exchange at the Si/electrolyte and PS/electrolyte interfaces. These new results involving the deposition of iron-group materials into porous p-type silicon are useful for future silicon technologies. a) Present address: Département des Matériaux et Composants,

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Electrodeposition of Fe–Co Alloys into Nanoporous p-type Silicon: Influence of the Electrolyte Composition

et al. 2002

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“…The pores have however an ink-bottle shape, which results from the fact that the hole concentration is not constant close to the surface. This effect can be avoided by means of a two step formation of PS [10]. At high HF concentration (35 wt% HF), the pores still propagate along the ͗100͘ direction, but they have very branched walls and they form a very 250 nm 500 nm 35% HF-EtOH ; 3 mA/cm 2 ; 300 s 15% HF-EtOH ; 3 mA/cm 2 ; 300 s rough interface with the Si substrate.…”

mentioning

confidence: 99%

Interface investigations of iron and cobalt metallized porous silicon: AES and FTIR analyses

Hamadache

Renaux

Duvail

et al. 2003

phys. stat. sol. (a)

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Porous silicon (PS) is characterized by a very large surface that is very reactive with the external environment. In this work, the chemical composition of the internal surface of both freshly anodically formed and electroplated PS with Fe and Co metals was studied. The samples were analyzed by scanning electron microscopy (SEM), Fourier transform infrared absorption spectroscopy (FTIR) and Auger electron spectroscopy (AES) combined to sputter depth profiling. Mesoporous structures with different morphologies were obtained in p-type Si(100) anodized in ethanoic hydrofluoric acid solutions. We showed that the surface of as-prepared PS is practically oxide-free and H-terminated, whereas the metal deposition process oxidizes the pore walls. Nevertheless, silicon atoms from PS surface are likely bonded to iron and cobalt ones.

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FeNi alloys electroplated into porous (n‐type) silicon

Ouir

Sam

Fortas

et al. 2008

Phys. Status Solidi (c)

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We report here a study on the electrodeposition of FeNi alloys into porous silicon (PS) made in n‐type Si substrate. The electrodeposited thin films were characterized by scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and X‐ray diffraction (XRD). The results show that the morphology, composition and structure of the deposited FeNi alloys are strongly dependent on the deposition conditions. A tubular structure of the FeNi alloys can be obtained with a chemical composition of (80%) Ni (20%) Fe. Finally, SEM characterization shows that a good filling of pores with FeNi alloy is achieved. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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New experiments on the electrodeposition of iron in porous silicon

Cited by 21 publications

References 9 publications

Electrodeposition of Fe–Co Alloys into Nanoporous p-type Silicon: Influence of the Electrolyte Composition

Electrodeposition of Fe–Co Alloys into Nanoporous p-type Silicon: Influence of the Electrolyte Composition

Interface investigations of iron and cobalt metallized porous silicon: AES and FTIR analyses

FeNi alloys electroplated into porous (n‐type) silicon

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