Next generation lithography—the rise of unconventional methods?

Kaestner, Marcus; Krivoshapkina, Yana; Rangelow, Ivo W.

doi:10.1016/b978-0-08-100354-1.00014-4

Cited by 6 publications

(5 citation statements)

References 91 publications

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“…In the past decades, the progress in the performance of electronic devices and their functionality commenced with the continuous decreasing of device size, such as transistors, due to the advancements in lithography. − Further downscaling of the device size has thus been enhanced by next-generation lithography techniques such as electron beam lithography (EBL), helium ion beam lithography (HIBL), direct self-assembly, and extreme ultraviolet lithography among others. Apart from novel lithographic techniques to achieve the required resolution, novel new resist materials and process integration are required to address the current patterning challenges, arising with new technology nodes. , Even though, it is perceived that compatible resist technology differs entirely from the subsequent progress of the node, more particularly with regard to the stochastics of line edge/width roughness (LER/LWR), resolution, and sensitivity trade-off .…”

Section: Introductionmentioning

confidence: 99%

Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography

Kumar

Chauhan

Moinuddin

et al. 2020

ACS Appl. Mater. Interfaces

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Hybrid metal−organic cluster resist materials, also termed as organo-inorganics, demonstrate their potential for use in next-generation lithography owing to their ability for patterning down to ∼10 nm or below. High-resolution resist patterning is integrally associated with the compatibility of the resist and irradiation of the exposure source. Helium ion beam lithography (HIBL) is an emerging approach for the realization of sub-10 nm patterns at considerably lower line edge/width roughness (LER/ LWR) and higher sensitivity as compared to electron beam lithography (EBL). Here, for the first time, a negative tone resist incorporating nickel (Ni)-based metal−organic clusters (Ni-MOCs) was synthesized and patterned using HIBL and EBL at 30 keV. This resist comprises a nickel-based metal building unit covalently linked with the organic ligand: m-toluic acid (C 8 H 8 O 2 ). Dynamic light scattering confirmed a narrow size distribution of ∼2 nm for metal−organic cluster (MOC) formulations. High-resolution ∼9 nm HIBL line patterns were well developed at a sensitivity of 22 μC/cm 2 and at a significantly low LER and LWR of 1.81 ± 0.06 and 2.90 ± 0.06 nm, respectively. Analogous highresolution patterns were also observed in EBL with a sensitivity of 473 μC/cm 2 . Hence, the Ni-MOC-based resist investigated using HIBL and EBL elucidates the ability of its potential for the sub-10 nm technology node, under standard processing conditions.

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Section: Introductionmentioning

confidence: 99%

Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography

Kumar

Chauhan

Moinuddin

et al. 2020

ACS Appl. Mater. Interfaces

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“…These are discussed further in the ‘Emerging Lithographic Techniques’ section. Alternative methods such as deep UV lithography (DUVL), extreme UV lithography (EUVL) and x-ray lithography (XRL) are detailed below and involve reducing the wavelength of the light [ 35 , 72 , 73 ].…”

Section: Conventional Lithographic Techniquesmentioning

confidence: 99%

“…X-ray lithography (XRL) (Fig. 1 d ) [ 42 ] is a similar process to UVL except for the UV light being replaced with x-rays created by a synchrotron source, with wavelengths between 0.4 and 4 nm [ 73 ]. The amount of x-ray absorption is dependent on the thickness, density and the atomic number of the material it is travelling through [ 118 ].…”

Section: Conventional Lithographic Techniquesmentioning

confidence: 99%

Advances in lithographic techniques for precision nanostructure fabrication in biomedical applications

Stokes,

Clark,

Odetade

et al. 2023

Discover Nano

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Nano-fabrication techniques have demonstrated their vital importance in technological innovation. However, low-throughput, high-cost and intrinsic resolution limits pose significant restrictions, it is, therefore, paramount to continue improving existing methods as well as developing new techniques to overcome these challenges. This is particularly applicable within the area of biomedical research, which focuses on sensing, increasingly at the point-of-care, as a way to improve patient outcomes. Within this context, this review focuses on the latest advances in the main emerging patterning methods including the two-photon, stereo, electrohydrodynamic, near-field electrospinning-assisted, magneto, magnetorheological drawing, nanoimprint, capillary force, nanosphere, edge, nano transfer printing and block copolymer lithographic technologies for micro- and nanofabrication. Emerging methods enabling structural and chemical nano fabrication are categorised along with prospective chemical and physical patterning techniques. Established lithographic techniques are briefly outlined and the novel lithographic technologies are compared to these, summarising the specific advantages and shortfalls alongside the current lateral resolution limits and the amenability to mass production, evaluated in terms of process scalability and cost. Particular attention is drawn to the potential breakthrough application areas, predominantly within biomedical studies, laying the platform for the tangible paths towards the adoption of alternative developing lithographic technologies or their combination with the established patterning techniques, which depends on the needs of the end-user including, for instance, tolerance of inherent limits, fidelity and reproducibility.

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“…The direct imprint patterning method provides a monolithic integration alternative with better throughput. 11,12 In this study, we benefited from a mold extracted from commercial camera CCDs with 2D patterns. Polydimethylsiloxane (PDMS) and its curing agent with the aspect ratio of 10:1 were mixed and poured on the mold.…”

Section: Fabrication Of 2d Plasmonic Sensor and Cell Culturementioning

confidence: 99%

Detection of Nicotine Effect on Colon Cells in a Plasmonic Platform

et al. 2020

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Introduction: Smoking as one of the causes of various diseases has encouraged worldwide studies on its adverse pharmacological effects on different organs. Nicotine may influence the smooth muscles of the colon and subsequently the gut motility, which leads to a change in the moving rate of digested material through the gastrointestinal tract. Methods: Among various techniques, optical detection methods benefit from non-contact and highsensitivity for studying the early effect of nicotine on the cells. Thus, we used an optically ellipsometric method to get the fast and sensitive nicotine effect on the colon cell. Two-dimensional plasmonic platforms by gold deposition onto the polydimethylsiloxane polymer (PDMS) patterned substrate were used as the guest medium of the cell and the sample was excited by all of the visible region wavelengths at different exposure time and maintenance time. Results: Our results showed that the phase difference between each polarization increased by augmenting the exposure time of smoke over the cell at a fixed maintenance time and there was a general red-shift by increasing the maintenance time at a fixed exposure time. Conclusion: Using different exposure time to cigarette smoke, we optically showed that the cigarette containing the addicting chemical of nicotine had a direct effect on the cultured colon cells on our 2D biocompatible plasmonic chip. It demonstrated considerable changes in the amplitude and phase of the interacted light by injecting nicotine into the system with the aid of the label-free and non-invasive plasmonic technique

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Next generation lithography—the rise of unconventional methods?

Cited by 6 publications

References 91 publications

Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography

Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography

Advances in lithographic techniques for precision nanostructure fabrication in biomedical applications

Detection of Nicotine Effect on Colon Cells in a Plasmonic Platform

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