1979
DOI: 10.1109/tmag.1979.1060117
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Niobium Josephson junctions with doped amorphous silicon barriers

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Cited by 29 publications
(10 citation statements)
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“…By inspecting the published I-V characteristics of junctions with doped Si barriers, we noted that IcRN products reported for nonhysteretic JJs with various barrier thicknesses, doping types and levels in [10]- [12], [34]- [37] and other publications do not exceed 0.36 mV, the same value as the IcRN of critically damped Nb/AlOx-Al/Nb junctions at Jc = 10 μA/μm 2 . Therefore, it appears to be not possible to optimize junctions with doped Si barriers by varying d and x to produce nonhysteretic junctions with values of Jc in the practical range, Jc ≤ 2 mA/μm 2 , and IcRN products comparable to values obtained in self-shunted tunnel junctions, about πΔNb/2 ≈ 2 mV.…”
Section: B Nb/si:nb/nb Josephson Junctionsmentioning
confidence: 84%
See 1 more Smart Citation
“…By inspecting the published I-V characteristics of junctions with doped Si barriers, we noted that IcRN products reported for nonhysteretic JJs with various barrier thicknesses, doping types and levels in [10]- [12], [34]- [37] and other publications do not exceed 0.36 mV, the same value as the IcRN of critically damped Nb/AlOx-Al/Nb junctions at Jc = 10 μA/μm 2 . Therefore, it appears to be not possible to optimize junctions with doped Si barriers by varying d and x to produce nonhysteretic junctions with values of Jc in the practical range, Jc ≤ 2 mA/μm 2 , and IcRN products comparable to values obtained in self-shunted tunnel junctions, about πΔNb/2 ≈ 2 mV.…”
Section: B Nb/si:nb/nb Josephson Junctionsmentioning
confidence: 84%
“…Some promise was shown by Nb-based JJs with amorphous Si (a-Si) barriers doped by Nb, W, or other dopants forming deep impurity levels close to the middle of Si band gap. They were proposed and investigated a long time ago; see, e.g., [10], [34], and references therein to even earlier work. Recently, JJs with a-Si:Nb barriers [35], [36] found applications in programmable Josephson voltage standards and waveform synthesizers developed at NIST USA and PTB Germany.…”
Section: B Nb/si:nb/nb Josephson Junctionsmentioning
confidence: 99%
“…Among devices with direct conduction, relatively high values of V c required for digital applications have been demonstrated by Nb-based junctions with amorphous Si barriers doped by various impurities creating deep levels near the middle of the band gap, like Nb, W, etc. ; see [128] and references therein, [129-[131], and many older works, e.g., [132]- [134]. From the author's point of view, their only advantage is that, at large levels of doping (~ 10%), selfshunting and nonhysteretic behavior is obtained.…”
Section: Vlsi Technology Developmentmentioning
confidence: 99%
“…High speed sensors within the gas stream at several places allow us to measure the instantaneous T, P, and m for frequencies up to [20][21][22][23][24][25][26][27][28][29][30] Slow speed germanium thermometers on the i sothermal izers are used to measure their temperature. Temperature control of the isothermal izers is critical to the operation of the system.…”
Section: Description Of Present Methodsmentioning
confidence: 99%
“…The Naval Research Laboratory has a joint effort with Sperry Research Center to fabricate all refractory superconducting tunnel devices with CVD deposited polysilicon barrier [23], [24].…”
mentioning
confidence: 99%