2009
DOI: 10.1016/j.cplett.2009.06.007
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Novel fabrication of UV photodetector based on ZnO nanowire/p-GaN heterojunction

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Cited by 85 publications
(21 citation statements)
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“…Chen and co-workers describe the vapor-liquid-solid deposition technique, using this technique they deposit a ZnO thin film on p-GaN/ sapphire substrate, to fabricate p-n heterojunction photodetector [19]. Lin et al fabricate ZnO UV photodetector by using molecular beam epitaxy.…”
Section: Introductionmentioning
confidence: 98%
“…Chen and co-workers describe the vapor-liquid-solid deposition technique, using this technique they deposit a ZnO thin film on p-GaN/ sapphire substrate, to fabricate p-n heterojunction photodetector [19]. Lin et al fabricate ZnO UV photodetector by using molecular beam epitaxy.…”
Section: Introductionmentioning
confidence: 98%
“…Recently, wide bandgap semiconductors such as ZnO, GaN, and TiO 2 have been commonly investigated owing to their promising advantages such as high sensitivity at room temperature [4,5,6,7,8,9]. However, indium–gallium–oxide (IGO) is not commonly reported in the literature.…”
Section: Introductionmentioning
confidence: 99%
“…For practical use, UV detectors should exhibit excellent operational characteristics, including rapid response, high sensitivity, and good wavelength selectivity. Among them, nanodevices that can vary their electrical signals under illumination have attracted much attention because of their high sensitivity and ease of signal reading 9 10 11 . Such detectors can be categorized as either Schottky or ohmic nanodevices.…”
mentioning
confidence: 99%