Novel high-performance piezoresistive shock accelerometer for ultra-high-g measurement utilizing self-support sensing beams

Abstract

This study describes the design and implementation of a novel high-performance piezoresistive accelerometer for the measurement of shock acceleration of up to 100 000 g. The structure of the accelerometer sensing chip was implemented with piezoresistive self-support beams. The piezoresistors were made in piezoresistive sensing micro-beams, which were independent of support beams, to weaken the correlation between measuring sensitivity and resonant frequency. In this way, the measuring sensitivity of the proposed novel piezoresistive accelerometer could be increased without sacrificing resonant frequency. The optimization of structural dimensions of the sensing chip was conducted through finite element method simulations. The sensing chip was fabricated employing bulk-micromachining technology with a silicon-on-insulator wafer. The fabricated accelerometer was encapsulated in stainless shell and evaluated using the Hopkinson bar system. Results demonstrated the proposed accelerometer with the measuring sensitivity of 0.54 µV/g/V and the resonant frequency of 445 kHz.

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“…[85,86] On the other hand, bridge configuration entails proof mass anchored to the supports through a released piezoresistive structure, where any movement of the proof mass results in direct axial deformation of this bridge. [84,87,88] The third and final architecture involves further thinning of the bridge in the form of a Si NW. [47,54] Compared to the embedded architecture, the bridge-type or NW-based configurations offer independent optimization of the proof mass and piezoresistive geometry.…”

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“…Sub-millimeter packaged devices have been presented in [74] for biomedical sensors. Ultra-high-g sensors have been implemented with piezoresistors [75] and as reported in [76] they are a popular approach for high-g shock sensing. Ultra-sensitive, nanometric-gauge-based accelerometers have been reported several times exploiting the so-called M&NEMS process [77].…”

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