Novel methods for the fabrication of ferromagnetic nickel and nickel boride thin films

Abstract

Patwa, A.; Kher, S.S.; Boag, N.M.; and Dowben, Peter A., "Novel methods for the fabrication of ferromagnetic nickel and nickel boride thin films" (1994 Metal-rich nickel boride thin films fabricated from boron-containing precursor compounds by a cluster deposition process are shown to be ferromagnetic. The metal-rich films fabricated by this approach exhibit hysteresis curves similar to those obtained for pure nickel foils. These films are a mixture of pure nickel and the N&B nickel boride phases. It is postulated that the hysteresis curves with smaller remnant magnetizations obtained from these films are a consequence of Ni,B inclusions within the films. Other novel organometallic source compounds for nickel chemical-vapor deposition are briefly reviewed.

MOCVD-Processed Ni Films from Nickelocene. Part II: Carbon Content of the Deposits

“…These drawbacks are illustrated in the diagram by the extended error bars, which represent deviations both between different samples with the same carbon content and between different positions within the same sample. [20,21] It has also been reported that M s decreases when carbon has diffused into Ni, in particular if the non-ferromagnetic nickel carbide Ni 3 C is formed. First, the resistivity of the films is systematically higher than that of bulk Ni.…”

Síntese e caracterização de nanocompósitos Ni: SiO2 processados na forma de filmes finos

“…As concentrações de Ni listados de 0, 3 e 6% são, na realidade, menores que as nominais adicionadas às resinas precursoras, que foram preparadas com composição nominal de 5 e 10%. Acredita-se que esta diferença pode estar relacionada a três fatores principais: (a) presença de uma certa quantidade de carbono amorfo nos filmes, que é remanescente da queima dos precursores; (b) evaporação do níquel na forma de carbonila de níquel durante o processo de calcinação e (c) perda de níquel durante o processo de preparação das amostras para as análises de FAAS 35,36 .…”

A Thermodynamic Estimation of the Chemical Vapor Deposition of Some Borides

“…As to BCl dissociation, BCl g "BCl g #0.5Cl g , [7] its probability is negligible. There is an analogous situation when the boron source used is BBr .…”