Novel Photolithography to Perform the Oblique Microstructure

Tsai, Hui-Ping; Chang, Yung-Cheng; Chen, Hongan; Shing, Tai-Kang

doi:10.1109/memsys.2006.1627808

Cited by 1 publication

(2 citation statements)

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“…In recent years, inclined microstructures were fabricated using ultraviolet (UV) light lithography. [8][9][10][11][12][13][14][15] The advantages of UV lithographic technology are batch manufacturing, low cost, high unity, and small size. Though many kinds of the inclined micro-fabrication techniques such as inclined exposure, [8][9][10] moving mask, 11) and microlens projection exposure 12) have already been established, they still have some difficult limitation in forming microstructures.…”

Section: Introductionmentioning

confidence: 99%

“…[8][9][10][11][12][13][14][15] The advantages of UV lithographic technology are batch manufacturing, low cost, high unity, and small size. Though many kinds of the inclined micro-fabrication techniques such as inclined exposure, [8][9][10] moving mask, 11) and microlens projection exposure 12) have already been established, they still have some difficult limitation in forming microstructures. The method of inclined exposure can cause the non-uniform patterning of nanostructures because of the different distances from the light source to every surface structure.…”

Section: Introductionmentioning

confidence: 99%

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A Novel Fabrication Method for Forming Inclined Groove-Based Microstructures Using Optical Elements

Huang

Chang

Chou

et al. 2008

jjap

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Backlight modules with inclined groove-based microstructures, such as V-cuts for liquid crystal display (LCD) applications, have been developed. This study presents a novel photolithography technology which utilizes an inclined exposure method. An inclined microstructure surface fabricated with a controlled optical path is exposed using refracted ultraviolet (UV) light. A weight-bearing point of inclined exposure uses an optical element prism which is placed between the UV light source and the photoresist. This approach utilizes a prism-based exposure which complies with Snell's law. Different from conventional photolithography, the angle needed and the smooth surfaces of microstructures fabricated using this approach can be easily controlled. The aim of this study is to fabricate inclined groove-based microstructures on optical film to form structures ranging from 30 to 90 . This research made use of microstructure plates with dimensions of 30 Â 30 mm 2 and with surface roughness less than 20 nm. The results from this study could provide an important foundation of knowledge for the fabrication of next-generation displays.

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