Novel Photoresists Incorporating [(Trimethylsilyl)oxy]styrene

Preparation and self-assembly of two-length-scale A-b-(B-b-A)n-b-B multiblock copolymers

“…A combination of monomers that satisfies these requirements is styrene and p-hydroxystyrene. Poly(p-hydroxystyrene) (pHS) and its derivatives are of interest for, e.g., applications in photoresist materials, [34][35][36][37] removal of organic material from aqueous waste via adsorption, 38 and as light-emitting devices. 39,40 In order to effectively polymerize p-hydroxystyrene, the acidic proton needs to be protected.…”

Trifluoromethanesulfonic Acid Catalyzed Preparation of Symmetrical Diaryl Sulfoxides from Arenes and Thionyl Chloride

“…Despite that deactivated aromatics do not react under the reaction conditions, this methodology of diaryl sulfoxides should provide a convenient route to the preparation of tri-arylsulfonium salts which are used as photoactive cationic initiators 7 and for the photogeneration of protonic acid in the lithographic resist field. 8,9…”

Trifluoromethanesulfonic Acid Catalyzed Preparation of Symmetrical Diaryl Sulfoxides from Arenes and Thionyl Chloride

“…Despite that deactivated aromatics do not react under the reaction conditions, this methodology of diaryl sulfoxides should provide a convenient route to the preparation of triarylsulfonium salts which are used as photoactive cationic initiators 7 and for the photogeneration of protonic acid in the lithographic resist field. 8,9 …”