2007
DOI: 10.1016/j.jcrysgro.2006.11.324
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Nucleation of AlN on SiC substrates by seeded sublimation growth

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Cited by 11 publications
(9 citation statements)
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“…It has been observed also by other researcher [8] that the growth of AlN on SiC substrate is accompanied by the appearance of HHs. HHs size increased with increasing temperature and decreasing N 2 pressure.…”
Section: Microrod and Free-standing Growthsupporting
confidence: 58%
“…It has been observed also by other researcher [8] that the growth of AlN on SiC substrate is accompanied by the appearance of HHs. HHs size increased with increasing temperature and decreasing N 2 pressure.…”
Section: Microrod and Free-standing Growthsupporting
confidence: 58%
“…Furthermore, impurity incorporation and intrinsic defect formation are known to depend on the facet on which growth proceeds [35]. Thus, seeds of different crystallographic orientation are employed, namely with  = 0°, 23°, 32°, and 42° off-orientation angle in respect to the c-axis towards the m-plane normal, so that their surfaces approximately correspond to Al-polar (0001), (10)(11)(12)(13)(14), (10)(11)(12)(13), and (10-12) AlN planes. In the second set of experiments, small pieces of single-crystalline SiC or carbon are placed on top of the AlN source material, intended to provide an additional and constant supply of silicon and carbon species during growth.…”
Section: Crystal Growthmentioning
confidence: 99%
“…This work builds on the author's previous investigation into the initial growth stage of AlN on SiC [20], which established the optimum growth temperature of AlN as 1830-1850 1C, based on 20-30 mm thick single-crystalline AlN films grown on 81 off-axis 4H-SiC and on-axis 6H-SiC. The off-axis-grown film consisted of regular step features on the surface, while the on-axis-grown film contained hexagonal sub-grains of varying sizes.…”
Section: Introductionmentioning
confidence: 99%