2007
DOI: 10.1088/1464-4258/9/5/015
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Numerical investigation of the parameter dependences of nanolithography by using micro-structured metal grating

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Cited by 4 publications
(3 citation statements)
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“…The groove widths of silicon gratings were later measured accurately using an AFM and found to vary from 359 to 480 nm. Normal transmission through the gratings with different groove widths are expected to have resonant peaks at different wavelengths as the gratings resonant peak is highly sensitive to the grating width, grating depth and periodicity [ 16 , 17 ].…”
Section: Fabricationmentioning
confidence: 99%
“…The groove widths of silicon gratings were later measured accurately using an AFM and found to vary from 359 to 480 nm. Normal transmission through the gratings with different groove widths are expected to have resonant peaks at different wavelengths as the gratings resonant peak is highly sensitive to the grating width, grating depth and periodicity [ 16 , 17 ].…”
Section: Fabricationmentioning
confidence: 99%
“…Interference in the optical near field has been utilized to produce the fine patterns. [18] Zhao et al [19] provided a valid way for high resolution photolithography according to the electric field distribution of the microstructured metal grating. It should be interesting to know clearly about the axial spatial evolution of the optical field of a high density grating and to widen applications of the Talbot effect, such as the nearfield photolithography and the fabrication of threedimensional nanostructures.…”
mentioning
confidence: 99%
“…et al[145]. Moreover, several theoretical and numerical simulation works on plasmonic lithography based on metal mask configurations have been reported[146][147][148][149][150][151][152][153]. However, most of these reported techniques require the fabrication of a fine-period mask grating or hole array and are found to be not cost effective.Another promising plasmonic lithography configuration is the Kretschmann configuration.…”
mentioning
confidence: 99%