Numerical studies on PACVD processes used for TiN multifunctional films using metal organic precursors

Son, Seok-Jae; Yi, Kyongsu; Joo, Ji Bong; Mahrholz, J.; Rie, K.‐T.

doi:10.1016/j.jcrysgro.2007.11.163

Cited by 5 publications

(3 citation statements)

References 11 publications

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“…As widely used software in multi-physics simulations, CFD-ACE+ performs very well in simulating low temperature plasma. These simulation predictions [30,40,41] all agree with the experiments respectively, such as the experimental work on fluorocarbon plasma used as the benchmark cases for validation of CFD-ACE+ plasma surface reaction capabilities. The reactors are the modified versions of GECRC built by MILLER et al [33] .…”

Section: Regression Orthogonal Designsupporting

confidence: 68%

Modeling Approach and Analysis of the Structural Parameters of an Inductively Coupled Plasma Etcher Based on a Regression Orthogonal Design

Cheng¹,

Zhu²,

Ji³

2012

Plasma Sci. Technol.

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The geometry of an inductively coupled plasma (ICP) etcher is usually considered to be an important factor for determining both plasma and process uniformity over a large wafer. During the past few decades, these parameters were determined by the "trial and error" method, resulting in wastes of time and funds. In this paper, a new approach of regression orthogonal design with plasma simulation experiments is proposed to investigate the sensitivity of the structural parameters on the uniformity of plasma characteristics. The tool for simulating plasma is CFD-ACE+, which is commercial multi-physical modeling software that has been proven to be accurate for plasma simulation. The simulated experimental results are analyzed to get a regression equation on three structural parameters. Through this equation, engineers can compute the uniformity of the electron number density rapidly without modeling by CFD-ACE+. An optimization performed at the end produces good results.

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Section: Regression Orthogonal Designsupporting

confidence: 68%

Modeling Approach and Analysis of the Structural Parameters of an Inductively Coupled Plasma Etcher Based on a Regression Orthogonal Design

Cheng¹,

Zhu²,

Ji³

2012

Plasma Sci. Technol.

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“…A finer cell model sometimes would save CPU time by stable convergence. A drift-diffusion model is used and the numerical formulation is published elsewhere [6,7,8]. The driving frequency was 60 Hz, commercial household power frequency.…”

Section: Experiments and Simulation Setupmentioning

confidence: 99%

Development of a Plasma Training Lab kart: System Setup and Numerical Simulation

Joo

2017

Appl. Sci. Converg. Technol.

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A mobile lab kart for plasma training is developed with a high vacuum pumping system, vacuum gauges and a glass discharge tube powered by a high voltage transformer connected to a household 60 Hz line. A numerical model is developed by using a commercial multiphysics software package, CFD-ACE+ to analyze the experimental data. Simulations for argon and nitrogen were carried out to provide fundamental discharge characteristics. Variations of the kart configuration were demonstrated: a glass tube with three electric probes, optical emission spectrometer attachment and infra red thermal imaging system to give more detailed analysis of the discharge characteristics.

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“…deposition temperatures by CVD using metal-organic precursors such as tetrakis-dimethylamido-titanium (TDMAT) and tetrakisdiethylamido-titanium (TDEAT) [9]. However, the low deposition temperature (commonly less than 600 • C) has been found to yield poor crystallinity and low deposition rate (R dep ) [10,11], which is unattractive for the applications to high-speed cutting tools.…”

Section: Introductionmentioning

confidence: 99%

Effect of NH3 on the preparation of TiNx films by laser CVD using tetrakis-diethylamido-titanium

Gong

Goto

2009

Journal of Alloys and Compounds

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Numerical studies on PACVD processes used for TiN multifunctional films using metal organic precursors

Cited by 5 publications

References 11 publications

Modeling Approach and Analysis of the Structural Parameters of an Inductively Coupled Plasma Etcher Based on a Regression Orthogonal Design

Modeling Approach and Analysis of the Structural Parameters of an Inductively Coupled Plasma Etcher Based on a Regression Orthogonal Design

Development of a Plasma Training Lab kart: System Setup and Numerical Simulation

Effect of NH3 on the preparation of TiNx films by laser CVD using tetrakis-diethylamido-titanium

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