1987
DOI: 10.1007/978-3-642-82835-5
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Oberflächen- und Dünnschicht-Technologie

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Cited by 81 publications
(16 citation statements)
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“…If the residual energy is high enough, the atoms further diffuse on the substrate surface. Like this, single adatoms can form stable or metal stable clusters [26,27].…”
Section: Application Of Aluminum Via Vacuum Evaporation and Layer Growthmentioning
confidence: 99%
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“…If the residual energy is high enough, the atoms further diffuse on the substrate surface. Like this, single adatoms can form stable or metal stable clusters [26,27].…”
Section: Application Of Aluminum Via Vacuum Evaporation and Layer Growthmentioning
confidence: 99%
“…Generally, three models are described, which cover a variety of possible interactions between substrate and adatoms of which model in Figure 2a,c are the two extremes and Figure 2b is a combination of both [26][27][28][29]. In the model of Frank van der Merwe (Figure 2a), the cohesion between the adatoms is weaker than the binding to the substrate.…”
Section: Application Of Aluminum Via Vacuum Evaporation and Layer Growthmentioning
confidence: 99%
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“…B. [1] Hierbei werden diverse PVD-und CVD-Verfahren sowie das Verfahren des Plasmaspritzens angewandt, um auf der Oberfläche des Implantate» eine geeignete Schicht ses und den negativ geladenen Elektronen umgeben ist. Mit einem Hochspannungsgenerator werden rechteckige, negative Hochspannungspulse ' zwischen 10 und 100 kV an das isoliert gelagerte Objekt angelegt.…”
Section: Introductionunclassified