ON CHARACTERISTICS OF SPUTTERED Co-Cr-Ta MEDIA USING PEN FILM SUBSTRATE FOR HIGH DENSITY MAGNETIC RECORDING

Abstract

-. A roll coater of the Opposing Targets Sputtering and the TEONEX® (PEN) film substrate were used to prepare continuous webs for Co-Cr-Ta thin film media. And surface roughness, microstructure and magnetic properties of the continuous webs were studied in this paper. The webs obtained under the argon gas pressure in the range of 0.15 to 0.75 Pa and the roll temperature of approx. 150°C, showed the following properties which will make the development of thin film media prospective on reliability and manufacturability. Microstructures in the Co-Cr-Ta thin films of 150 nm thickness were observed to be Co-rich particles of some 20 nm in diameter being packed densely and homogeneously, segregated by 2 nm-thick Cr-rich boundary layers. Surface roughness (Rmax) and magnetic properties of the webs were almost constant and showed high quality (Rmax < 10 nm, Hc.l ~ 1000 oe, HCII::;; 260 oe and Hk -4.3 koe).

VOIDLESS GRAINBOUNDARY GROWTH PROCESS OF Co-Cr THIN FILMS

“…Heat flux meters [6,8] were used to evaluate the heat exchange energy of sputtered Co-Cr adatoms and plasma bombardment on the deposition plane under plasma conditions listed in Table 1 [9] and another FrS apparatus [8]. Figure 1 shows an example of the FTS system with vertical and in-plane magnetic fields ( NFTS ) for confining almost all y-electrons in the sputtering plasma space.…”