1985
DOI: 10.1016/0167-577x(85)90132-6
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On the location of the misfit dislocations in InGaAs/InP mbe single heterostructures

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Cited by 15 publications
(2 citation statements)
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“…[ 5–7 ] However, these materials are typically grown by complex methods, including molecular beam epitaxy (MBE) and metal–organic chemical vapor deposition, resulting in complicated manufacturing procedures and subsequent high cost. [ 8–12 ] Although evaporated Ge x Sn 1‐ x films have been explored as alternative materials for SWIR photodetectors, their practical applications are limited by the poor device performance, e.g., low specific detectivity. [ 13–15 ] Therefore, it remains challenging to develop novel material systems that can combine a simple preparation process and high device performance.…”
Section: Figurementioning
confidence: 99%
“…[ 5–7 ] However, these materials are typically grown by complex methods, including molecular beam epitaxy (MBE) and metal–organic chemical vapor deposition, resulting in complicated manufacturing procedures and subsequent high cost. [ 8–12 ] Although evaporated Ge x Sn 1‐ x films have been explored as alternative materials for SWIR photodetectors, their practical applications are limited by the poor device performance, e.g., low specific detectivity. [ 13–15 ] Therefore, it remains challenging to develop novel material systems that can combine a simple preparation process and high device performance.…”
Section: Figurementioning
confidence: 99%
“…[5][6][7] Most commercially available infrared detectors rely on epitaxially grown III-V and HgCdTe-based photodetectors, which require complex growth processes such as molecular beam epitaxy (MBE) and metal-organic chemical vapor deposition (MOCVD), resulting in high production costs and many manufacturing steps. 8 Therefore, there is an urgent need to develop optical absorbers to easily fabricate SWIR photodetectors and improve device performance.…”
Section: Introductionmentioning
confidence: 99%