2000
DOI: 10.1039/b001354o
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On the synthesis and manipulation of InAs quantum dots

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Cited by 34 publications
(26 citation statements)
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“…High quality crystalline III‐V materials are harder to prepare (particles or films) due to the increased covalent nature of these materials as compared to the analogous II‐VI materials. A mixture of the indium halide, indium(III)chloride, and As(NMe 2 ) 3 was thermolyzed at 167°C in 4‐ethylpyridine (solvent and capping agent) and produced high quality particles of InAs, showing distinct quantum size effects in its optical properties 27. However, preparing particles from halide‐containing precursors may result in some halide being retained within the desired material.…”
Section: Anaerobic Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…High quality crystalline III‐V materials are harder to prepare (particles or films) due to the increased covalent nature of these materials as compared to the analogous II‐VI materials. A mixture of the indium halide, indium(III)chloride, and As(NMe 2 ) 3 was thermolyzed at 167°C in 4‐ethylpyridine (solvent and capping agent) and produced high quality particles of InAs, showing distinct quantum size effects in its optical properties 27. However, preparing particles from halide‐containing precursors may result in some halide being retained within the desired material.…”
Section: Anaerobic Methodsmentioning
confidence: 99%
“…The size distribution, due to the lack of separation of nucleation from growth, is large, with the final product sometimes being contaminated by oxide. As mentioned, we used a similar approach to produce nanoparticles of InAs from the thermolysis of InCl 3 and As(NMe 2 ) 3 at 167°C in 4‐ethylpyridine 27. A single‐molecular precursor approach was also employed to produce III‐V nanoparticles of InP and GaP, using the indium/gallium diorganophosphide compounds, M(P t Bu 2 ) 3 (M = Ga, In), which were dissolved in 4‐ethylpyridine (solvent and capping agent) and refluxed for 7 days 41.…”
Section: Synthesis Of Nanoparticles From Single‐molecular Precursorsmentioning
confidence: 99%
“…The TOPO cap can be replaced by other organic capping agents such as pyridines, 4-picolene, tris(2-ethylhexyl)phosphate and 4-trifluoromethyl(thiophenol) (Kuno et al 1997). In a similar method, by using n-tributylphosphine (TBP) instead of TOP, Bowen-Katari et al (1994) produced near-defect-free CdSe nanoparticles at 350 • C. Other nanoparticles synthesized by organometallic routes include ZnSe (Hines & Guyot-Sinnest 1998;Ludolf et al 1998), InP (Green 1999;Guzelian et al 1996;Micic et al 1994Micic et al , 1995Micic et al , 1996Micic et al , 1997Norager & O'Brien 2000;Olshavsky et al 1990), GaP (Green 1999), InAs (Banin et al 1997;Green 1999;Green et al 2000) and GaAs (Norager & O'Brien 2000;Olshavsky et al 1990), summarized in table 2. In a recent development Peng & Peng (2001) reported the use of CdO complexed to hexylphosphonic acid (HPA) or tetradecylphosphonic acid (TDPA), as an alternative to (CH 3 ) 2 Cd, in TOPO syntheses of CdE (E = S, Se, Te).…”
Section: Introductionmentioning
confidence: 94%
“…After isolation it provides electronic passivation, prevents agglomeration and governs the solubility of the nanoparticles. (Green 1999;Guzelian et al 1996;Micic et al 1994Micic et al , 1995Micic et al , 1996Micic et al , 1997Norager & O'Brien 2000;Olshavsky et al 1990), GaP (Green 1999), InAs (Banin et al 1997;Green 1999;Green et al 2000) and GaAs (Norager & O'Brien 2000;Olshavsky et al 1990), summarized in table 2.…”
Section: Introductionmentioning
confidence: 99%
“…Single-source materials, 90 organoarsines, 91 and silylamides 92 have been used but pale in comparison to the quality of the trimethylsilyl-based syntheses. Initially, aminoarsines yielded poor results, 93 but have since been reexamined. Utilizing the understanding of the tris(dialyklamino)phosphine conversions, tris(dimethylamino)arsine was used to successfully produce a range of InAs nanomaterials with moderate (PLQY ∼30%, FWHM ∼100 nm) photoluminescent quality.…”
Section: Indium Arsenidementioning
confidence: 99%