Optical and structural properties of TiO2 thin films prepared by sol–gel spin coating

Elfanaoui, A.; Elhamri, E.; Boulkaddat, L.; Ihlal, A.; Bouabid, K.; Laânab, L.; Taleb, Abdelhafed; Portier, X.

doi:10.1016/j.ijhydene.2010.07.057

Cited by 73 publications

(34 citation statements)

References 19 publications

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“…Metode pembuatan lapisan TiO 2 telah banyak diteliti. Seperti yang telah dilaporkan oleh Senthil et al yang berhasil memfabrikasi lapisan TiO 2 dengan fasa anatase serta ukuran butir 19 nm [6] dan diperoleh nilai energi gap sebesar 3,7 eV [7].…”

Section: Pendahuluanunclassified

Fabrikasi Lapisan TiO2 menggunakan Metode Spin-Coating dengan Variasi Pengadukan dan Karakterisasi Sifat Optisnya

Zharvan

Daniyati

Santoso

et al. 2015

JFA

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IntisariTelah dilakukan penelitian mengenai fabrikasi lapisan TiO2 dengan metode spin-coating. Serbuk TiO2 disintesis dengan menggunakan metode ko-presipitasi yang diperoleh dari prekursor TiCl3 dengan variasi waktu pengadukan 5, 10 dan 25 jam. Serbuk TiO2 selanjutnya diuji XRD untuk mengetahui fasa yang terkandung. Analisis fasa menunjukkan bahwa semua serbuk yang disintesis memiliki fasa anatase dengan ukuran kristal 11,8 nm; 10,7 nm dan 9,6 nm seiring meningkatnya lama waktu pengadukan. Lapisan TiO2 difabrikasi dengan menggunakan metode spin coating dan dikarakterisasi menggunakan XRD, SEM dan UV-Vis spektrofotometer untuk mengetahui struktur, morfologi dan sifat optik. Keseluruhan lapisan yang telah difabrikasi memiliki fase anatase dengan morfologi permukaan yang kurang merata serta lapisan memiliki nilai celah energi 3,99 ± 0,2 eV; 3,98 ± 0,2 eV dan 3,97 ± 0,2 eV berurutan untuk lapisan 5, 10 dan 25 jam bergantung pada serbuk dan perlakuan saat fabrikasi. AbstractFabrication of TiO2 film has been conducted. TiO2 nanopowders were prepared by co-precipitation method from TiCl3 as a precursor by varying their mixing time duration 5, 10 and 25 hours. TiO2 nanopowders were checked using XRD to examine their structure and having anatase phase with crystalline size of 11.8 nm, 10.7 nm and 9.6 nm respectively for the corresponding mixing duration. TiO2 film were fabricated using spin coating method then checked using XRD, SEM and UV-Vis spectrophotometer to examine their structure, morphology and optical properties. The prepared films also contain an anatase phase of TiO2 with non-uniform morphology and their respective band gap value are 3.99 ± 0.2 eV, 3.98 ± 0.2 eV and 3.97 ± 0.2 eV depending on the powders and their treatment.KATA KUNCI: TiO 2 , anatase, XRD, spin-coating, UV-Vis I. PENDAHULUANTitanium dioksida merupakan material polimorpi dengan tiga bentuk fase yakni fase anatase, rutile dan brookite. Anatase merupakan struktur yang memiliki sifat fotokatalis yang baik jika dibandingkan dengan rutile atau brookite [1]. Oleh karena itu, sangat penting untuk memperhatikan parameter seperti struktur kristal, morfologi permukaan dan kestabilan fasa [2] dalam menyintesis serbuk TiO 2 yang akan diaplikasikan sebagai fotokatalis.Terdapat berbagai metode untuk menyintesis material TiO 2 seperti sol-gel. Dengan menggunakan metode ini, serbuk TiO 2 berhasil disintesis dengan fasa anatase dan memiliki ukuran kristal sebesar 7 nm untuk metode sol-gel [3]. Selain menggunakan metode sol-gel, TiO 2 juga dapat disintesis dengan metode sintesis pembakaran, fasa gas [2] ataupun de- * E-MAIL: vicran.zharvan@gmail.com † E-MAIL: darminto@physics.its.ac.id ngan metode ko-presipitasi dalam keadaan hidrotermal. Keuntungan menggunakan metode ko-presipitasi karena dapat dikerjakan pada temperatur rendah serta kemudahan mengatur ukuran partikel. Hasil yang diharapkan dengan menggunakan metode ini adalah diperolehnya ukuran partikel yang lebih kecil dan lebih homogen dibandingkan dengan metode pencampuran larutan padat dan ukuran yang l...

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Section: Pendahuluanunclassified

Fabrikasi Lapisan TiO2 menggunakan Metode Spin-Coating dengan Variasi Pengadukan dan Karakterisasi Sifat Optisnya

Zharvan

Daniyati

Santoso

et al. 2015

JFA

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“…Among them, a soft polymer mold such as a poly (dimethylsiloxane) (PDMS) is very useful in the NIL process using functional resists containing organic solvents due to its high gas permeability and the capability of absorbing an organic solvent. Most of the functional resist, such as sol-gel solution [61][62][63][64][65][66], nanoparticle-dispersed solution [67][68][69][70][71][72][73], metal nano-ink [74][75][76][77][78], spin-on-glass (SOG) resist [79][80][81][82], are formulated by mixing precursors or nanoparticles in an organic solvent. To fabricate nanostructures consisting of functional materials by NIL, the solvent in the functional resist and gas products generated from hydrolysis-condensation reaction [83][84][85][86] should be removed during the NIL process.…”

Section: Process Types Of Direct Nil Using Functional Resistsmentioning

confidence: 99%

“…Currently, diverse inorganic materials including ZnO, indium tin oxide (ITO), TiO 2 , SiO 2 , SnO 2 , Al-doped ZnO, and so on can be fabricated by sol-gel process [61][62][63][64][65][66]. In comparison to other film deposition methods, such as sputtering, chemical vapor deposition or pulsed laser deposition, the sol-gel process has distinguishing advantages including low process cost, good compositional control and large area production.…”

Section: Nil Processes Using Sol-gel Solutionsmentioning

confidence: 99%

Recent progress in direct patterning technologies based on nano-imprint lithography

Byeon

Lee

2012

Eur. Phys. J. Appl. Phys.

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Abstract. Nano-imprint lithography (NIL) is one of the most promising patterning technologies, in which nano-and micro-patterns are fabricated on various substrates. NIL provides high throughput and low cost in fabricating nano-structures due to its simple process and allows resolution below 10 nm without issues of light diffraction with conventional lithographic techniques. Its patterning mechanism is based on mechanical deformation of a polymer resist, which is simply done by pressing with a mold. This patterning mechanism also enables inorganic and organic-inorganic hybrid materials to be directly patterned by NIL. This article covers the recent progress of NIL-based direct patterning techniques and their applications to devices. Recently, functional nano-and micro-patterns have been applied to various electronic devices for the enhancement of overall performance. Fabrication methods of these devices are difficult using conventional lithographic techniques due to complex processes, high cost and low throughput. Direct NIL technique using functional resist can simply fabricate functional nano-and micro-structures and thus can be usefully applied to various industries.

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“…Over 96% of the world-wide use of titanium is in its oxide form, TiO 2 (titanium dioxide), thus creating a high demand for this material, due to a wide range of potential applications for environmental purposes [1]. It is extensively used for photo degradation of organic and inorganic pollutants [2], photovoltaic energy production [3], hydrogen production by water photo-splitting [4,5], and gas sensing [6,7].…”

Section: Introductionmentioning

confidence: 99%

Annealing Temperature Effect on the Physical Properties of Titanium Oxide Thin Films Prepared by the Sol-Gel Method

K¹,

I²,

Jlassi³

et al. 2017

J Phys Chem Biophys

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Optical and structural properties of TiO2 thin films prepared by sol–gel spin coating

Cited by 73 publications

References 19 publications

Fabrikasi Lapisan TiO2 menggunakan Metode Spin-Coating dengan Variasi Pengadukan dan Karakterisasi Sifat Optisnya

Fabrikasi Lapisan TiO2 menggunakan Metode Spin-Coating dengan Variasi Pengadukan dan Karakterisasi Sifat Optisnya

Recent progress in direct patterning technologies based on nano-imprint lithography

Annealing Temperature Effect on the Physical Properties of Titanium Oxide Thin Films Prepared by the Sol-Gel Method

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