2014
DOI: 10.1016/j.spmi.2013.10.014
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Optical investigation of InAs quantum dashes grown on InP(001) vicinal substrate

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Cited by 5 publications
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“…1(d) , where differences in anisotropy could have resulted in the DOLP range of 0.5 to 1.0 at 200 K. Although the control of QD anisotropy is not very straightforward, it is worth noting that control of nanostructure aspect ratio has been achieved in conventional III-V semiconductors, e.g. using miscut substrates to encourage the formation of quantum dashes 51 . Our theory thus provides a guideline to target asymmetric QD structures for achieving emitters with a further improved temperature stability of the DOLP ρ .…”
Section: Resultsmentioning
confidence: 99%
“…1(d) , where differences in anisotropy could have resulted in the DOLP range of 0.5 to 1.0 at 200 K. Although the control of QD anisotropy is not very straightforward, it is worth noting that control of nanostructure aspect ratio has been achieved in conventional III-V semiconductors, e.g. using miscut substrates to encourage the formation of quantum dashes 51 . Our theory thus provides a guideline to target asymmetric QD structures for achieving emitters with a further improved temperature stability of the DOLP ρ .…”
Section: Resultsmentioning
confidence: 99%