Optical lithography simulation: Introduction to SPESA

Bernard, Douglas A.

doi:10.1016/0167-9317(85)90048-6

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Reduced-order Photolithography Model For Controller Design1

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1994

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Cited by 11 publications

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“…Complete fundamental knowledge of the physical relation among the photolithography variables is not yet available. There do exist photolithography models that attempt to cope with the multidimensional nature of the process, such as those implemented in the programs SAMPLE (Oldham et al, 1979), PROLITH (Mack, 1985), PROSIM (Garza and Grindle, 1986), and SPESA (Bernard, 1985). Although these models provide quantitative process descriptions useful for the purpose of comparing alternative processing procedures and for analyzing process trends, they are too extensive for on-line production control.…”

Section: Reduced-order Photolithography Model For Controller Designmentioning

confidence: 99%

Adaptive control of photolithography

Crisalle¹,

Soper²,

Mellichamp³

et al. 1992

AIChE Journal

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Section: Reduced-order Photolithography Model For Controller Designmentioning

confidence: 99%

Adaptive control of photolithography

Crisalle¹,

Soper²,

Mellichamp³

et al. 1992

AIChE Journal

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Modelling of resist performance

Hartney

1994

Adv Material for Optics Elec

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Simulation of lithographic processes using novolac/diazonaphthoquinone resists has become widespread over the past 15 years. Several refinements to the original Dill model have been made to account for experimentally observed behaviour. Models have also been extended to cover other resist chemistry, including electron beam resists, chemically amplified resists and surface-imaging approaches. While these models are not yet mature, useful insight to the chemical mechanisms and processing can be gained through their use.

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