We report postgrowth micro-Raman stress imaging of cracks in ͑111͒ homoepitaxial diamond films. Undoped and phosphorous-doped diamond thin films grown by microwave plasma-enhanced chemical-vapor deposition on Ib ͑111͒-oriented diamond substrates have been studied by confocal micro-Raman spectroscopy. For comparison purposes, a film grown on a ͑100͒ Ib substrate was also examined. Thanks to the confocal optics, the Raman signal arising from the epilayer could be discriminated from that arising from the substrate. As was already reported, the ͑111͒ films exhibited substantial tensile stress, indicated by a downshift in the Raman peak and by spontaneous cracking in films grown thicker than 5 m. The sixfold symmetry of the cracks supported that the films were homoepitaxial. A high compressive stress was also detected at the substrate near surface, and a partial stress relaxation was observed to occur in the vicinity of the cracks. Possible origins of the high tensile stress observed in the ͑111͒ homoepitaxial diamond films are discussed.