Optical Pattern Generation Using a Spatial Light Modulator for Maskless Lithography

Jung, Il Woong; Wang, Jen-Shiang; Solgaard, Olav

doi:10.1109/jstqe.2007.893095

Cited by 16 publications

(5 citation statements)

References 11 publications

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“…Phase light modulation has applications across the spectrum from lithography [10,11] in the UV, to displays including augmented and virtual reality, as well as holographic 3D display [8,12], to communications and LiDAR in the near-infrared [5,7]. All of these applications take advantage of the PLM's ability to engineer the wavefront to redirect light more efficiently than amplitude modulation.…”

Section: Introductionmentioning

confidence: 99%

Diffraction Efficiency Characteristics for MEMS-Based Phase-Only Spatial Light Modulator with Nonlinear Phase Distribution

Ketchum

Blanche

2021

Photonics

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Micro-electro mechanical systems (MEMS)-based phase-only spatial light modulators (PLMs) have the potential to overcome the limited speed of liquid crystal on silicon (LCoS) spatial light modulators (SLMs) and operate at speeds faster than 10 kHz. This expands the practicality of PLMs to several applications, including communications, sensing, and high-speed displays. The complex structure and fabrication requirements for large, 2D MEMS arrays with vertical actuation have kept MEMS-based PLMs out of the market in favor of LCoS SLMs. Recently, Texas Instruments has adapted its existing DMD technology for fabricating MEMS-based PLMs. Here, we characterize the diffraction efficiency for one of these PLMs and examine the effect of a nonlinear distribution of addressable phase states across a range of wavelengths and illumination angles.

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Section: Introductionmentioning

confidence: 99%

Diffraction Efficiency Characteristics for MEMS-Based Phase-Only Spatial Light Modulator with Nonlinear Phase Distribution

Ketchum

Blanche

2021

Photonics

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“…In comparison to most commonly used liquid crystal display (LCD) technology, such devices providing extremely faster switching speeds (<30μs) between different types of modulation patterns, less attenuation (higher fill factor of %90 than the LC with %70), ~6.6 times higher power transfer efficiency, ~11 times higher contrast ratio, as twice as higher diffraction efficiency of %88, feasibility for wide range of wavelengths (UV to NIR) can be used as a digital spatial light modulator [11,12]. Up to date MEMS micro-mirror arrays have been proposed for such many application as programmable imaging, display technologies, spectroscopy, microscopy, 3D metrology, and maskless lithography [13][14][15]. However, use of such devices for arbitrary waveform generation has not been utilized.…”

Section: Introductionmentioning

confidence: 99%

Analytical study on arbitrary waveform generation by MEMS micro mirror arrays

Kalyoncu¹,

Huang²,

Song³

et al. 2012

Opt. Express

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Abstract:We provide analytical modeling and the detailed procedure that is used in recently proposed arbitrary waveform generation technique by using MEMS digital micro-mirror arrays. We estimate the achievable temporal resolution, repetition rate, modulation index and the rise/fall times of the final waveform as figure of merit in the proposed systems. We show that reducing the diffraction limit via increasing the ratio of beam size to lens focal length (>0.075) and the spatial eScholarship provides open access, scholarly publishing services to the University of California and delivers a dynamic research platform to scholars worldwide. modulation down to single mirror pitch size (10.8μm), waveforms up to 18GHz repetition rates with >90% modulation index and <100ps rise times are achievable. Theoretical calculations are compared with experimental generation of 120MHz square waves and 160MHz sawtooth waves and obtained good agreement. Abstract:We provide analytical modeling and the detailed procedure that is used in recently proposed arbitrary waveform generation technique by using MEMS digital micro-mirror arrays. We estimate the achievable temporal resolution, repetition rate, modulation index and the rise/fall times of the final waveform as figure of merit in the proposed systems. We show that reducing the diffraction limit via increasing the ratio of beam size to lens focal length (>0.075) and the spatial modulation down to single mirror pitch size (10.8μm), waveforms up to 18GHz repetition rates with >90% modulation index and <100ps rise times are achievable. Theoretical calculations are compared with experimental generation of 120MHz square waves and 160MHz sawtooth waves and obtained good agreement.

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“…In an optical lithography system, removing masks by use of the hologram can offer economical benefits because it saves the time and cost involved with fabricating elaborate masks. Spatial light modulators, such as the liquid crystal device and digital micromirror device (DMD), are available to generate the pattern: this kind of technique is usually referred to as maskless lithography [9][10][11][12].…”

Section: Introductionmentioning

confidence: 99%

Phase-conjugate holographic lithography based on micromirror array recording

2011

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We present phase-conjugate holographic lithography with a hologram recorded by a digital micromirror device (DMD) and a telecentric lens. In our lithography system, a phase-conjugate hologram is applied instead of conventional masks or reticles to form patterns. This method has the advantage of increasing focus range, and it is applicable to the formation of patterns on fairly uneven surfaces. The hologram pattern is dynamically generated by the DMD, and its resolution is mainly determined by the demagnification of the telecentric lens. We experimentally demonstrate that our holographic lithographic system has a large focus range, and it is feasible to make a large-area hologram by stitching each pattern generated by the DMD without a falling off in resolution.

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Optical Pattern Generation Using a Spatial Light Modulator for Maskless Lithography

Cited by 16 publications

References 11 publications

Diffraction Efficiency Characteristics for MEMS-Based Phase-Only Spatial Light Modulator with Nonlinear Phase Distribution

Diffraction Efficiency Characteristics for MEMS-Based Phase-Only Spatial Light Modulator with Nonlinear Phase Distribution

Analytical study on arbitrary waveform generation by MEMS micro mirror arrays

Phase-conjugate holographic lithography based on micromirror array recording

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