2006
DOI: 10.1016/j.mee.2005.10.044
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Optical properties of cubic SiC grown on Si substrate by chemical vapor deposition

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Cited by 15 publications
(4 citation statements)
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“… The figure shows the bonding energy of Si‐C in SD‐SiC as a broad peak at 840 cm −1 with no shoulder evident at 950 cm −1 . In a more recent work, a deep flat band between 770 and 920 cm −1 was reported as characteristic for 3C‐SiC formed on Si substrate by chemical vapor deposition …”
Section: Resultsmentioning
confidence: 88%
“… The figure shows the bonding energy of Si‐C in SD‐SiC as a broad peak at 840 cm −1 with no shoulder evident at 950 cm −1 . In a more recent work, a deep flat band between 770 and 920 cm −1 was reported as characteristic for 3C‐SiC formed on Si substrate by chemical vapor deposition …”
Section: Resultsmentioning
confidence: 88%
“…These properties are often associated with the effect of the spatial limitation of electrons within nanocrystallites of the system. Different approaches have therefore been proposed in the literature to modify the crystalline structure of the layers, and composite materials with nanocrystallites have been produced using various techniques and a choice of different processing conditions [24][25][26][27][28][29]. A decrease in the crystallite size by using electrochemical methods or choosing the corresponding technological growth conditions allows one to observe the photoluminescence with an increased emission efficiency in 3C-SiC films in the UV spectral region [8], including the photoluminescence associated with the manifestation of the quantum confinement effect in the electronic spectrum of nanocrystalline structures [14].…”
Section: Light-emitting Propertiesmentioning
confidence: 99%
“…Therefore, using Si substrates for deposition of 3C-SiC epilayers minimizes the cost of the wafers significantly compared with the homoepitaxial films grown on 4H-SiC or 6H-SiC substrates. Moreover, the devices fabricated based on 3C-SiC on Si substrate have the potential of being integrated to the welldeveloped Si-based devices [15,16].…”
Section: Introductionmentioning
confidence: 99%