GaAs) 1Ϫx (Si 2 ) x metastable alloys were epitaxially grown on ͑001͒, ͑111͒, ͑110͒, and ͑112͒ GaAs. Singlecrystal alloys were obtained for Si concentrations in the range 0рxр0.43. At higher concentrations the Si segregated. The long-range order parameter, for each growth direction studied, was determined as a function of Si concentration by high-resolution x-ray diffraction. The behavior of this parameter with Si concentration is influenced by growth direction. This fact provides direct evidence that the substrate geometry affects the atomic ordering of these alloys. The results obtained from these alloys provide additional support to the validity of the proposal that the growth direction influences the order-disorder transition observed in other alloys of this kind.Several compounds of the (III-V) 1Ϫx (IV 2 ) x metastable alloys have been widely studied, due to their potential of tailoring the properties of III-V semiconductors, which may be useful for device applications. 1-5 Moreover, these alloys have been grown as model systems to study order disorder transitions, 1-5 where an ordered phase is associated to the zinc blende structure ͑III-V-like͒ and a disordered phase is associated to the diamond structure ͑IV-like͒. This order disorder transition exists at some intermediate value x c when IV atoms are increased in concentration from xϭ0 to xϭ1. [1][2][3][4][5] We have recently proved that the order disorder transition in (GaAs) 1Ϫx (Ge 2 ) x metastable alloys is influenced by growth direction and that the atomic ordering in these alloys is ruled mainly by the substrate geometry. 6,7 Our results ruled out the applicability of the thermodynamic models to our experimental data, since none of them predicted any different critical concentration for samples grown on differently oriented substrates. On the other hand, a model of the growth process based on Monte Carlo simulations gave results in good agreement with the experimentally observed longrange order ͑LRO͒ in (GaAs) 1Ϫx (Ge 2 ) x alloys, for all the studied growth directions. In our previous work, 6,7 we stated that quite likely the growth direction might affect the order disorder transition of similar (III-V) 1Ϫx (IV 2 ) x alloys, since when grown on ͑001͒ oriented substrates, different metastable alloys (GaAs) 1Ϫx (Ge 2 ) x , 1,5 (GaSb) 1Ϫx (Ge 2 ) x , 2 and (GaAs) 1Ϫx (Si 2 ) x ͑Ref. 4͒ have a similar critical concentration x c (001)Ϸ0.3 of the IV element. The growth of (III-V) 1Ϫx (IV 2 ) x metastable alloys, other than (GaAs) 1Ϫx (Ge 2 ) x , would give insight on the generality of our previous result, and the applicability of the growth model to other alloys of this kind. In addition, (GaAs) 1Ϫx (Si 2 ) x alloys may find applications as buffer layers for the growth of GaAs on Si. Undesirable effects induced by the large lattice mismatch between GaAs and Si may be reduced by growing a (GaAs) 1Ϫx (Si 2 ) x buffer layer of a graded Si concentration. On the other hand, the possible application of these alloys in semiconductor laser technology has been de...