1994
DOI: 10.1049/el:19940243
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Optically transparent indium-tin-oxide (ITO) ohmiccontacts in thefabrication of vertical-cavity surface-emitting lasers

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Cited by 34 publications
(12 citation statements)
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“…ρ C = 17 µ cm 2 (for 450 • C) and 25 µ cm 2 (for 500 • C). From this study, we conclude that the optimal annealing temperature for the Ti/Au/ITO/GaAs interface is 500 • C. This leads to a specific resistance contact value twice higher than that obtained for a standard optimal contact annealed at 450 • C. It is worth noting that these results are not in agreement with the literature: indeed, Chua et al [10] reached an optimal specific contact resistance by annealing ITO/Mg-doped GaAs layers at a temperature higher than 600 • C and Matin et al [9] optimized the contact resistance at 550 • C in the case of an ITO/Zn-doped GaAs interface. To explain this discrepancy, further information on the annealing effects on the materials is needed.…”
Section: Electrical Properties Of Ito/gaas Contactmentioning
confidence: 86%
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“…ρ C = 17 µ cm 2 (for 450 • C) and 25 µ cm 2 (for 500 • C). From this study, we conclude that the optimal annealing temperature for the Ti/Au/ITO/GaAs interface is 500 • C. This leads to a specific resistance contact value twice higher than that obtained for a standard optimal contact annealed at 450 • C. It is worth noting that these results are not in agreement with the literature: indeed, Chua et al [10] reached an optimal specific contact resistance by annealing ITO/Mg-doped GaAs layers at a temperature higher than 600 • C and Matin et al [9] optimized the contact resistance at 550 • C in the case of an ITO/Zn-doped GaAs interface. To explain this discrepancy, further information on the annealing effects on the materials is needed.…”
Section: Electrical Properties Of Ito/gaas Contactmentioning
confidence: 86%
“…Most of the published work on ITO contacts deals with sputtering deposition and thermal postannealing optimization to obtain the best trade-off between the optical and electrical ITO properties, and between these characteristics and the technological constraints involved in device processing. Studies performed on ITO deposition usually conclude that the higher the annealing temperature, the higher the ITO intrinsic conductivity [7,8], although the best interface resistance of the ITO/GaAs contact is often reported for lower annealing temperatures, but for divergent values [9][10][11]. In this paper, we investigate the properties of ITO deposited on p-type Be-doped GaAs layers and particularly the effect of thermal annealing on the ITO/GaAs interface.…”
Section: Introductionmentioning
confidence: 99%
“…These include the use of ITO [12,13], Auplated ITO [14] as the top contact and ITO as top ring contact [15]. However, the effects of these new contact schemes on the VCSEL performances such as kink characteristics of L-I curve and modulation response were not clearly mentioned.…”
Section: Introductionmentioning
confidence: 99%
“…These include the use of ITO [15,16], Au-plated ITO [17] as the top contact and ITO as top ring contact [18]. However, the effect of these new contact scheme on the VCSEL performance such as kink characteristics of L-I curve, and modulation response were not clearly mentioned.…”
Section: Introductionmentioning
confidence: 99%