2010
DOI: 10.1016/j.sna.2010.06.008
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Optimization and characterization of wafer-level adhesive bonding with patterned dry-film photoresist for 3D MEMS integration

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Cited by 38 publications
(31 citation statements)
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“…Recently, dry film photopolymers have moved away from their original purpose of providing sacrificial layers for the fabrication of printed circuit boards and were used for fabricating electroplating moulds [34,35], stamp cavities [36] and replication tools [37,38], for wafer bonding [39,40] and sensor packaging [41], as an etch mask for silicon-DRIE [42] and as a permanent material for microfluidic applications [43][44][45][46]. So far, the most frequently used permanent films are Riston (DuPont) and Ordyl SY (Elga Europe).…”
Section: Selective Sealing Of Silicon Microchannelsmentioning
confidence: 99%
“…Recently, dry film photopolymers have moved away from their original purpose of providing sacrificial layers for the fabrication of printed circuit boards and were used for fabricating electroplating moulds [34,35], stamp cavities [36] and replication tools [37,38], for wafer bonding [39,40] and sensor packaging [41], as an etch mask for silicon-DRIE [42] and as a permanent material for microfluidic applications [43][44][45][46]. So far, the most frequently used permanent films are Riston (DuPont) and Ordyl SY (Elga Europe).…”
Section: Selective Sealing Of Silicon Microchannelsmentioning
confidence: 99%
“…The microfluidic chamber is formed by bonding the glass wafers and the Si-spacer together with 60 µm thick layers of patterned dry-film-resist (Ordyl) as the adhesive intermediate layers. This full wafer-level adhesive bonding technique creates leak-tight bonds of high strength (13.4 MPa) and high bond yield (> 95%) [8]. Fig.…”
Section: Fabricationmentioning
confidence: 99%
“…Recently, dry film photoresists have moved away from their original purpose of providing sacrificial layers for the fabrication of printed circuit boards and were used to manufacture electroplating molds [34], replication tools [35], for wafer bonding [36] and sensor packaging [47], as an etch mask for silicon-DRIE [38] and as a permanent material for microfluidic applications [39].…”
Section: Introductionmentioning
confidence: 99%