Optimization of deposition rate in HiPIMS by controlling the peak target current

Tiron, Vasile; Velicu, Ioana–Laura; Vasilovici, Ovidiu; Popa, G.

doi:10.1088/0022-3727/48/49/495204

Cited by 42 publications

(22 citation statements)

References 27 publications

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“…Figure 13 is a schematic diagram that explains the reasons for the small deposition rate: (a) ions return effect [45], which contributes to the accessible current caused by self-sputtering [46]; (b) yield effect [47]; (c) species effect [48]; (d) transport effect [49]; and (e) gas rarefaction effect [50]. In general, most of these factors strongly influence the deposition rate in HiPIMS when the pulse width is higher than 50 μs [51].…”

Section: Deposition Ratementioning

confidence: 99%

“…Based on the aforementioned loss routes in figure 13, the deposition rate in HiPIMS can be improved by (i) controlling the parameters of the pulse power supply, e.g. pulse voltage [50], pulse duration [40,52,53], repetition frequency [54], peak current [51,55,56], and peak power [54]. It is found that strong self-sputtering or the gas rarefaction process do not occur in short pulse durations in HiPIMS; (ii) modification of the magnetic field distribution in magnetron [49,[57][58][59]; and (iii) operation of the HiPIMS process in the multi-pulse mode, in which the metallic ion back attraction is efficiently limited [60].…”

Section: Deposition Ratementioning

confidence: 99%

See 1 more Smart Citation

High power impulse magnetron sputtering and its applications

Yang

Liu

Chen

2018

Plasma Sci. Technol.

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High power impulse magnetron sputtering (HiPIMS) has attracted a great deal of attention because the sputtered material is highly ionized during the coating process, which has been demonstrated to be advantageous for better quality coating. Therefore, the mechanism of the HiPIMS technique has recently been investigated. In this paper, the current knowledge of HiPIMS is described. We focus on the mechanical properties of the deposited thin film in the latest applications, including hard coatings, adhesion enhancement, tribological performance, and corrosion protection layers. A description of the electrical, optical, photocatalytic, and functional coating applications are presented. The prospects for HiPIMS are also discussed in this work.

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Section: Deposition Ratementioning

confidence: 99%

Section: Deposition Ratementioning

confidence: 99%

High power impulse magnetron sputtering and its applications

Yang

Liu

Chen

2018

Plasma Sci. Technol.

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“…The decrease in the deposition rate at 60 µs could be because of the yield effect and peak amplitude of discharge current caused by self-sputtering and working gas recycling (referring to the recycling of the ions of the inert working gas) [ 62 ]. Moreover, other factors like the ionic species effect and transport effect significantly influence the deposition rate in HiPIMS when the pulse width is higher than 50

s [ 63 ]. However, it was found that the impact of self-sputtering and gas rarefaction can be omitted by applying a shorter pulse width or using bipolar pulse mode.…”

Section: Resultsmentioning

confidence: 99%

Fabrication and Mechanical Properties of Cr2AlC MAX Phase Coatings on TiBw/Ti6Al4V Composite Prepared by HiPIMS

Qureshi

Tang

et al. 2021

Materials

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The high-power impulse magnetron sputtering (HiPIMS) technique is widely used owing to the high degree of ionization and the ability to synthesize high-quality coatings with a dense structure and smooth morphology. However, limited efforts have been made in the deposition of MAX phase coatings through HiPIMS compared with direct current magnetron sputtering (DCMS), and tailoring of the coatings’ properties by process parameters such as pulse width and frequency is lacking. In this study, the Cr2AlC MAX phase coatings are deposited through HiPIMS on network structured TiBw/Ti6Al4V composite. A comparative study was made to investigate the effect of average power by varying frequency (1.2–1.6 kHz) and pulse width (20–60 μμs) on the deposition rate, microstructure, crystal orientation, and current waveforms of Cr2AlC MAX phase coatings. X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM) were used to characterize the deposited coatings. The influence of pulse width was more profound than the frequency in increasing the average power of HiPIMS. The XRD results showed that ex situ annealing converted amorphous Cr-Al-C coatings into polycrystalline Cr2AlC MAX phase. It was noticed that the deposition rate, gas temperature, and roughness of Cr2AlC coatings depend on the average power, and the deposition rate increased from 16.5 to 56.3 nm/min. Moreover, the Cr2AlC MAX phase coatings produced by HiPIMS exhibits the improved hardness and modulus of 19.7 GPa and 286 GPa, with excellent fracture toughness and wear resistance because of dense and column-free morphology as the main characteristic.

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“…The discharge was operated under a constant average target power of 45 W by varying the pulsing frequency. The deposition rate of SiO 2 thin film increased as the pulse duration decreased, due to reduced ion back-attraction effect [22]. Therefore, the deposition rates of the films deposited at 3, 5, and 10 µs were 4.2, 3.7, and 3.2 nm/min., respectively.…”

Section: Thin Film Characterizationmentioning

confidence: 93%

Ultra-Short Pulse HiPIMS: A Strategy to Suppress Arcing during Reactive Deposition of SiO2 Thin Films with Enhanced Mechanical and Optical Properties

et al. 2020

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In this contribution, based on the detailed understanding of the processes’ characteristics during reactive high-power impulse magnetron sputtering (HiPIMS), we demonstrated the deposition of silicon oxide (SiO2) thin films with improved optical and mechanical performances. A strategy for stabilizing the arc-free HiPIMS of Si target in the presence of oxygen was investigated. Arcing was suppressed by suitable pulse configurations, ensuring good process stability without using any feedback control system. It was found that arcing can be significantly alleviated when ultra-short HiPIMS pulses are applied on the target. The optical and mechanical properties of SiO2 coatings deposited at various pulsing configurations were analyzed. The coatings prepared by ultra-short pulse HiPIMS exhibited better optical and mechanical performance compared to the coatings prepared by long pulse HiPIMS. The optimized SiO2 coatings on quartz substrates exhibited an average transmittance of 98.5% in the 190–1100-nm wavelength range, hardness of 9.27 GPa, hardness/Young’s modulus ratio of 0.138, and critical adhesion load of 14.8 N. The optical and mechanical properties are correlated with the film morphology, which is inherently related to energetic conditions and process stability during film growth.

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Optimization of deposition rate in HiPIMS by controlling the peak target current

Cited by 42 publications

References 27 publications

High power impulse magnetron sputtering and its applications

High power impulse magnetron sputtering and its applications

Fabrication and Mechanical Properties of Cr2AlC MAX Phase Coatings on TiBw/Ti6Al4V Composite Prepared by HiPIMS

Ultra-Short Pulse HiPIMS: A Strategy to Suppress Arcing during Reactive Deposition of SiO2 Thin Films with Enhanced Mechanical and Optical Properties

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