2014
DOI: 10.1021/am4051102
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Optimizing Vanadium Pentoxide Thin Films and Multilayers from Dip-Coated Nanofluid Precursors

Abstract: Using an alkoxide-based precursor, a strategy for producing highly uniform thin films and multilayers of V2O5 is demonstrated using dip coating. Defect-free and smooth films of V2O5 on different surfaces can be deposited from liquid precursors. We show how pinholes are formed due to heterogeneous nucleation during hydrolysis as the precursor forms a nanofluid. Using knowledge of instability formation often found in composite nanofluid films and the influence of cluster formation on the stability of these films… Show more

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Cited by 24 publications
(36 citation statements)
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“…This also coincides with the observation that the V 2 O 5 -PEG AFM surface images show a higher concentration of crystalline grains than the V 2 O 5 -H 2 O thin films owing to the complexation of the vanadium alkoxide precursor with PEG and the ability of the more viscous precursor to coat the substrate and avoid further roughness development during hydrolysis to V 2 O 5 . 19 Additionally, the rms roughness of the V 2 O 5 -PEG thin films did not vary substantially after 6 h of annealing, where the phase conversion process is incomplete and some patchy areas of the film begin to show optical clearing to a transparent film. These results show that the PAD processes in the PEG-based films allow for smoother surface morphology upon initial deposition, and allow the film to maintain a lower degree of rms roughness during the phase conversion process to a completely transparent thin film for each annealing temperature and time investigated.…”
Section: Resultsmentioning
confidence: 90%
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“…This also coincides with the observation that the V 2 O 5 -PEG AFM surface images show a higher concentration of crystalline grains than the V 2 O 5 -H 2 O thin films owing to the complexation of the vanadium alkoxide precursor with PEG and the ability of the more viscous precursor to coat the substrate and avoid further roughness development during hydrolysis to V 2 O 5 . 19 Additionally, the rms roughness of the V 2 O 5 -PEG thin films did not vary substantially after 6 h of annealing, where the phase conversion process is incomplete and some patchy areas of the film begin to show optical clearing to a transparent film. These results show that the PAD processes in the PEG-based films allow for smoother surface morphology upon initial deposition, and allow the film to maintain a lower degree of rms roughness during the phase conversion process to a completely transparent thin film for each annealing temperature and time investigated.…”
Section: Resultsmentioning
confidence: 90%
“…The as-deposited V 2 O 5 is formed as amorphous nanoscale flakes of stoichiometric V 2 O 5 during hydrolysis of the liquid precursor and sets into a thin film form, as previously reported in dedicated electron microscopy analysis. 19,40 These amorphous flakes do not show a defined Raman spectrum until they are crystallized during annealing to form orthorhombic V 2 O 5 as seen in Fig. 4a.…”
Section: Resultsmentioning
confidence: 99%
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“…25 Solution processing offers a method of coating a wide range of substrate shapes to enable new applications as channel materials in flexible, wearable, and plastic electronics. 26 Solution processed deposition techniques employ liquid-based precursors to create films and nanostructures by spin-coating, 27 dipcoating, 28 ink-jet printing, and gravure printing. 29 Liquid precursor solutions can be alkoxides, nitrates, and carboxylates, 30 or other more complex inorganic-organic species.…”
Section: Introductionmentioning
confidence: 99%