Orbital moment probed spin orbit coupling effects on anisotropy and damping in CoFeB thin films

Abstract

Spin orbit coupling based direct correlation between magnetic anisotropy and damping is established in CoFeB thin films on compositional and stress variations.

Anisotropy and Domain Structure in Nanoscale-Thick MoS2/CoFeB Heterostructures: Implications for Transition Metal Dichalcogenide-Based Thin Films

“…The value of g obtained for both the samples are very large and this may be due to the major contribution from the orbital moments. 41 The large value of Lande g factor has also been reported for thin film of cobalt. 42,43 g is the measure of spin and orbital contribution to magnetic moment per atom and it is written as μ l /μ s = (g/2) − 1, where μ l and μ s are orbital and spin magnetic moments, respectively.…”

Tuning non-Gilbert-type damping in FeGa films on MgO(001) via oblique deposition

“…Different from the K 4 increases slightly with deposition angle in Co/Cu system [16], here the value of K 4 is the lowest at an oblique angle of 15°. It is well known that film stress significantly influences the crystallization tendency [30,31]. FeGa alloy is highly stressed sensitive due to its larger magnetostriction.…”

Influence of the thickness of an antiferromagnetic IrMn layer on the static and dynamic magnetization of weakly coupled CoFeB/IrMn/CoFeB trilayers

“…This UMA results from the breakdown of the azimuthal symmetry in the deposited films, which is likely to be caused by the anisotropic stress in the films generated due to the oblique deposition geometry [ 39 ]. Since CoFeB is highly sensitive to this induced anisotropic stress (owing to their large positive saturation magnetostriction coefficient λ s [ 40 ]), the deposition geometry effectively results in the observed UMA [ 41 ]. The UMA in films is found to be directly proportional to the thickness of the CoFeB layers (up to 50 nm, data not shown), demonstrating that the UMA is a volume anisotropy rather than an interfacial anisotropy.…”

“…In order to determine g values more accurately, we used the previously determined values of H k (from the angular FMR measurements) in Eq. 2 to obtain g and 4π M eff values as fitting parameters [ 41 , 44 ]. The resulting g values in the films ( Fig.…”