2008
DOI: 10.2494/photopolymer.21.107
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Organo-soluble Polyimides and Their Applications to Photosensitive Cover Layer Materials in Flexible Printed Circuit Boards

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Cited by 13 publications
(10 citation statements)
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“…It was also noted that there was no appreciable effect of the TFMB incorporation on CTE in comparison with the CTE values at lower TFMB contents (CTE = 90 ppm K 21 at TFMB = 0%, and 101 ppm K 21 at TFMB 50%), corresponding to their quite low values of birefringence (n = 0.0015-0.0085) as an indication of the degree of in-plane orientation. The results also mean that for the present rigid PAzM system the solution casting process cannot be a trigger for inducing pronounced in-plane orientation in contrast to the fact that a prominent casting induced in-plane orientation phenomena in some limited soluble PI systems [18,19]. The TFMB50/HFBAPP50 copolymer possessed a relatively low n av -based dielectric constant (3 cal 5 3405) which approximated the directly measured 3 1 value in addition to good film flexibility.…”
Section: Polymerization and Film Properties Of Tpal/tfmb-based Pazmsmentioning
confidence: 63%
“…It was also noted that there was no appreciable effect of the TFMB incorporation on CTE in comparison with the CTE values at lower TFMB contents (CTE = 90 ppm K 21 at TFMB = 0%, and 101 ppm K 21 at TFMB 50%), corresponding to their quite low values of birefringence (n = 0.0015-0.0085) as an indication of the degree of in-plane orientation. The results also mean that for the present rigid PAzM system the solution casting process cannot be a trigger for inducing pronounced in-plane orientation in contrast to the fact that a prominent casting induced in-plane orientation phenomena in some limited soluble PI systems [18,19]. The TFMB50/HFBAPP50 copolymer possessed a relatively low n av -based dielectric constant (3 cal 5 3405) which approximated the directly measured 3 1 value in addition to good film flexibility.…”
Section: Polymerization and Film Properties Of Tpal/tfmb-based Pazmsmentioning
confidence: 63%
“…Otherwise, significant curling occurs by a CTE mismatch in the laminates. This is a main reason why we have challenged the development of ultra-low-modulus PIs [6][7][8]. However, the molecular designs addressed to ultra-low modulus also give rise to an inevitable serious problem due to a decrease in the content of aromatic units, i.e., a drastic decrease in non-flammability.…”
Section: Low Modulus Pis For CL Filmsmentioning
confidence: 99%
“…approximate to 300 ºC [1], (b) poly(ester imide)s (PEsIs) as FPC base film materials showing low linear coefficients of thermal expansion (CTE) and low linear coefficients of humidity expansion (CHE) [2][3][4][5], and (c) ultra-low-modulus siloxane (or long alkyl chains)-containing PIs as cover layer (CL) materials [6][7][8]. However, in some cases, the molecular designs addressed to the addition of these new functions (low CHE for dimensional stability against moisture absorption and ultra-low-modulus for inhibition of FPC curling, etc.)…”
Section: Introductionmentioning
confidence: 99%
“…In addition, the cover layer coatings formed from the solutions of ultra‐low modulus materials cause no significant curling of FPCs. For this purpose, we have studied solution‐processable ultra‐low modulus PIs including a flexible siloxane block . However, the use of the siloxane‐containing PIs resulted in another serious problem, i.e., interpenetration of a plating solution during a subsequent Ni/Au plating process into the interface between the smooth surface (S‐side) of electro‐deposited copper foil and the cover layer.…”
Section: Introductionmentioning
confidence: 99%