Overcoat materials for acrylate resists to enhance their resolution

A Resolution Enhancement Material for 193-nm Lithography Comprising 2-Hydroxybenzyl Alcohol and Poly(vinyl alcohol) with Uniform Resist Pattern Shrinkage

“…We previously reported chemically shrinking materials [16] having enhanced affinity for 193-nm alicyclic acrylate resists for resist pattern thickening to produce smaller resist pattern spaces or holes. In a typical formulation of the material, poly(vinyl acetal) and tetramethoxymethyl glycoluril were used as a base polymer and a cross-linker, respectively.…”