Oxidation of Al(111) by electron impact on adsorbed H2O

Ebinger, H. D.; Yates, John T.

doi:10.1016/s0039-6028(98)00306-9

Cited by 22 publications

(28 citation statements)

References 46 publications

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“…Ru: Low Coverage Figure 3 shows the nuclear spin relaxation (NSR) rates a = 1 /T\ as a function of surface temperature in a wide range from 200 K to 1200 K. The surface is precovered with 0.02±0.01 ML of stable lithium to avoid the trapping of the very scarce 8 Li at rare surface sites [15,16]. The relaxation rate starts to rise with increasing surface temperature and reaches a maximum between 300 and 500 K, where the measurement is virtually impossible.…”

Section: Resultsmentioning

confidence: 99%

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Study of Li Diffusion on Metal and Semiconductor Surfaces via NQI Presented at the XVth International Symposium on Nuclear Quadrupole Interactions

Jänsch

2000

Zeitschrift Für Naturforschung A

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Nuclear magnetic resonance has been used to study the diffusion of lithium on a Ru(001) single crystal surface. The quadrupolar interaction of the radioactive probe nucleus 8 Li was utilized for this. In an online experiment the 8 Li nuclei are produced, thermalized and highly polarized before they land on the surface studied, the parity violating /3-decay revealing the sought after NMR/NQI nuclear information through the spatial asymmetry of the decay electrons. As a function of substrate temperature, alkali metal coverage and magnetic field the nuclear spin-lattice relaxation measurements show the existence of two distinctly different diffusion barriers on the surface, valued at 0.45 eV and 0.15 eV. The former is attributed to jumps from step to terrace sites, whereas the latter is the barrier between adjacent terrace sites. On the substrate Si(l 11)7x7 the relaxation measurements suggest a much higher diffusion barrier around 0.8 eV.PACS: 68.35Fx, 76.60Es, 82.65M

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Section: Resultsmentioning

confidence: 99%

“…Site blocking is assumed. The power spectrum determined from such a model then determines the relaxation rate [8,16]. The solid line in Fig.…”

Section: Resultsmentioning

confidence: 99%

Study of Li Diffusion on Metal and Semiconductor Surfaces via NQI Presented at the XVth International Symposium on Nuclear Quadrupole Interactions

Jänsch

2000

Zeitschrift Für Naturforschung A

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“…Water dissociation cross-sections σ H 2 O at electron energy of 1-50 eV were assumed energy independent and thus identical to values reported in the literature for electrons at 100 eV and 200 eV. 54,[58][59][60][61] Experimentally the ratio product/parent molecules was ≈1:100. This 1% yield has led us to consider the recombination rate constant k rec H 2 O as larger by several orders of magnitude than the water dissociation cross section, leaving [H 2 O] practically a constant value.…”

Section: E Model Simulations Of Electron Induced Methane Formation Kmentioning

confidence: 92%

Electron-induced chemistry of methyl chloride caged within amorphous solid water

Horowitz

Asscher

2013

The Journal of Chemical Physics

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The interaction of low energy electrons (1.0-25 eV) with methyl-chloride (CD3Cl) molecules, caged within Amorphous Solid Water (ASW) films, 10-120 monolayer (ML) thick, has been studied on top of a Ru(0001) substrate under Ultra High Vacuum (UHV) conditions. While exposing the ASW film to 3 eV electrons a static electric field up to 8 × 10(8) V∕m is developed inside the ASW film due to the accumulation of trapped electrons that produce a plate capacitor voltage of exactly 3 V. At the same time while the electrons continuously strike the ASW surface, they are transmitted through the ASW film at currents of ca. 3 × 10(-7) A. These electrons transiently attach to the caged CD3Cl molecules leading to C-Cl bond scission via Dissociative Electron Attachment (DEA) process. The electron induced dissociation cross sections and product formation rate constants at 3.0 eV incident electrons at ASW film thicknesses of 10 ML and 40 ML were derived from model simulations supported by Thermal Programmed Desorption (TPD) experimental data. For 3.0 eV electrons the CD3Cl dissociation cross section is 3.5 × 10(-16) cm(2), regardless of ASW film thickness. TPD measurements reveal that the primary product is deuterated methane (D3CH) and the minor one is deuterated ethane (C2D6).

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“…As discussed below, this would help account for the difficulty of producing atomically clean aluminum metal surfaces in vacuum. 53 …”

Section: Kinetic Energy Changes: Al 1 From Electropolished Aluminummentioning

confidence: 99%

Positive ion emission from oxidized aluminum during ultraviolet excimer laser irradiation

Khan

Langford

Dickinson

2011

Journal of Applied Physics

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Oxidation of Al(111) by electron impact on adsorbed H2O

Cited by 22 publications

References 46 publications

Study of Li Diffusion on Metal and Semiconductor Surfaces via NQI Presented at the XVth International Symposium on Nuclear Quadrupole Interactions

Study of Li Diffusion on Metal and Semiconductor Surfaces via NQI Presented at the XVth International Symposium on Nuclear Quadrupole Interactions

Electron-induced chemistry of methyl chloride caged within amorphous solid water

Positive ion emission from oxidized aluminum during ultraviolet excimer laser irradiation

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