P‐15.1: Research of Ultra‐low Reflection Metal for Metal Mesh

Abstract

This paper first theoretically simulates the change trend of Metal reflectance with various thicknesses of IZO and MoNbOxNy, and then experimentally produces an ultra‐low‐reflective Metal film layer: 60nm IZO + 45nm MoNbOxNy, with a reflectance of 4.97%. Furthermore, the reflectance uniformity is very excellent, the maximum & minimum values within the range of the average value ± 0.50%. Subsequently, this paper performed performance tests on IZO/MoNbOxNy Metal samples. The results are as follows: ① The reflectance in the whole band of 380nm ~ 780nm is stable, all within the range of 5% ~ 7%; ② Each film layer is well crystallized, and there is no abnormality in the microscopic morphology; ③ The adhesion is good; ④ The invisible performance Level is improved from Level 5 to Level 3. The indicators meet the requirements of the TP industry and can be used to make ultra‐low reflection and good invisible touch panels.

48.2: Dark Alloyed Metal‐Oxides for Sputter Deposition: Material comparison and processability

“…One way to cover those highly reflecting metallic areas is the application of a dark thin film material [1,2,3] with a thickness and diffraction index tailored for multibeam interference and index matching. One class of suitable materials which can be conveniently deposited on a large area by non-reactive DC PVD process are Molybdenum oxides (MoOx) [4] as part of the larger metal-oxide (MeOx) family.…”