P-type ZnO thin film deposited by spray pyrolysis technique: The effect of solution concentration

Characterization of SnO2:F thin films deposited by an economic spray pyrolysis technique

“…The spray pyrolysis is proven as one of the major techniques to deposit a wide variety of materials in thin film form. Also this technique offers easy way to dope films by merely adding it to the spray solution [13][14][15][16]. The prime requisite for obtaining good quality thin film is the optimization of preparative conditions, and spray pyrolysis make this optimization easier.…”

Preparation and characterizations of electroluminescent p-ZnO : N/n-ZnO : Ga/ITO thin films by spray pyrolysis method

“…Many researcher have focused on the preparation of p-type ZnO by doping ZnO with various element (such as: N, P, As, Sb, Li, Na, and K). [9][10][11][12][13][14][15][16][17][18][19][20][21][22][23][24][25][26][27] However, the drawback in ZnO is the presence of zinc interstitial (Zn i ) defect and oxygen vacancy defect (V o ) which makes it difficult to prepare p-type ZnO film. Among the various dopants for p-type ZnO films, N is the most potential since the ionic radii is close to the ionic radii of oxygen.…”

Preparation, Study and Nanoscale Growth of Indium Oxide Thin Films

“…Thin lms of In 2 O 3 can be prepared by a variety of techniques such as chemical vapour deposition [7], spray pyrolysis [8], vacuum evaporation [9], and magnetron sputtering [10]. Among these techniques, the chemical spray pyrolysis technique is one of the most commonly used techniques for preparation of transparent and conducting oxides owning to its simplicity, non-vacuum system of deposition, and hence inexpensive method.…”