Parallel‐Plate Electrochemical Reactor Model: A Method for Determining the Time‐Dependent Behavior and the Effects of Axial Diffusion and Axial Migration

Nguyen, Thien Vuong; Walton, Clifford W.; White, Ralph E.; Zee, John Van

doi:10.1149/1.2108550

Cited by 30 publications

(25 citation statements)

References 7 publications

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“…Silicon nitride films were deposited on bare silicon p-type substrates or on cured polyimide polymer film (1-2 ,im thick) spin-on silicon p-type substrates using a plasmadeposition system described elsewhere [ 11]. Before the nitride deposition, the polyimide films were cured in either hydrogen or nitrogen ambient for 30 minutes at temperatures equal to or slightly higher than the nitride-deposition temperatures.…”

Section: Methodsmentioning

confidence: 99%

“…FTIR, Auger, and NRA analysis techniques together with the CF 4 + 02 plasma etching of the nitride films have also been described in earlier papers [7,11,12]. It should be noted that, during the hydrogen-depth profile study of PECVD silicon nitride deposited on a polyimide layer, only the hydrogen concentration in the nitride layer can be determined accurately.…”

Section: Methodsmentioning

confidence: 99%

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Hydrogen Diffusion Between Plasma-Deposited Silicon Nitridepolyimide Polymer Interfaces

Nguyen

Kerbaugh

1987

MRS Proc.

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A Nuclear Reaction Analysis (NRA) for Hydrogen technique was used to analyze the hydrogen concentration near Plasma Enchanced Chemical Vapor Deposition (PECVD) silicon nitride-polyimide interfaces at various nitride-deposition and polyimide-polymer-curing temperatures. The CF 4 + 02 (8% 02) plasma-etch-rate variation of PECVD silicon nitride films deposited on polyimide appeared to correlate well with the variation of hydrogen-depth profiles in the nitride films. The NRA data indicate that hydrogen-depth-profile fluctuation in the nitride films is due to hydrogen diffusion between the nitride-polyimide interfaces during deposition. Annealing treatment of polyimide films in a hydrogen atmosphere prior to the nitride film deposition tends to enhance the hydrogen-depth-profile uniformity in the nitride films, and thus substantially reduces or eliminates variation in the nitride plasma-etch rate.

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Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Hydrogen Diffusion Between Plasma-Deposited Silicon Nitridepolyimide Polymer Interfaces

Nguyen

Kerbaugh

1987

MRS Proc.

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“…The calculation of current density for the PPER had been a frequent subject of study but reported mathematical models exist only for limited cases. For example, the models of Parrish and Newman [21] and Caban and Chapman [22] were based on the thin diffusion layer approach, while by Pickett [23] on the mass transfer control assumption, and those of White, Bain and Raible [24] and Nguyen, Walton and White [25] ignore axial diffusion and axial migration and do not account for high velocities…”

Section: Secondary Current Distributionmentioning

confidence: 99%

Scale-Up of Electrochemical Reactors

Sulaymon¹,

Abbar²

2012

Electrolysis

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“…Two-dimensional models have been discussed [1][2][3][4][5][6][7]. Most of these models feature infinitely wide electrodes where edge effects are absent, velocity profiles obtained from analytical solutions to the Navier-Stokes equations, and numerical solution of the model equations was based on the finite-difference technique developed by Newman [8] or one of its modifications (e.g.…”

Section: Introductionmentioning

confidence: 99%

Effect of a net on the limiting current distribution in a parallel plate electrochemical reactor: part I. Individual effects

Venkatraman

Zee

2009

J Appl Electrochem

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In some aqueous-metal batteries or electrochemical parallel plate reactors, the spacing between the electrodes is controlled by a porous net. This net affects the limiting current distribution because it disrupts the parabolic laminar flow velocity distribution. Here, computational fluid dynamics (CFD) is used to solve the Navier-Stokes equations surrounding the inert net and the effect of the net geometry on the limiting current density is studied. The location, spacing, and number of the longitudinal and transverse ribs of the net are shown to affect the local and average current density distributions on each of the two electrodes. The effect of transverse ribs on the current distribution was found to be much higher than the longitudinal ribs. The results show that the longitudinal ribs decrease the local current density at the electrode which is not in contact and increase the current density the space between two adjacent longitudinal ribs at the electrode in contact. The transverse ribs on the other hand, increase the local current density to very high values at the electrode that is not in contact. The current density, however, falls along the flow direction as it exits the transverse-ribs region. These effects were observed to be mainly due to the changes in flow field distribution. A deviation of -40% was observed for a system of 4 longitudinal ribs and no transverse ribs at the non-dimensional axial position 0.06. For 2 transverse ribs, the deviation at the same axial position was approximately 250% of the local current density. All the results are for a net with a spacing of 0.94 9 10 -3 m.Keywords Enhancement factor Á Limiting current Á Longitudinal and transverse ribs Á Nusselt number distribution Á Obstructed channel flowThickness of transverse rib in z direction (m) h 2Thickness of longitudinal rib in z direction (m) iLocal current density (A m -2 ) i avg Plate-average current density (A m -2 ) i avg-noribs Plate-average current density for no-ribs case(A m -2 ) i * Normalized local current density (dimensionless) i local current density averaged over g direction (A m -2 ) i Ã Normalized local current density averaged over g direction (dimensionless) k mMass transfer coefficient (m s -1 ) L Electrode length in y direction (m) l Equivalent diameter (m) l 1Live cell spacing in x direction (m) l 2Live cell spacing in y direction (m) n l Number of longitudinal ribs n t Number of transverse ribs NuLocal Nusselt number (dimensionless)

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Parallel‐Plate Electrochemical Reactor Model: A Method for Determining the Time‐Dependent Behavior and the Effects of Axial Diffusion and Axial Migration

Cited by 30 publications

References 7 publications

Hydrogen Diffusion Between Plasma-Deposited Silicon Nitridepolyimide Polymer Interfaces

Hydrogen Diffusion Between Plasma-Deposited Silicon Nitridepolyimide Polymer Interfaces

Scale-Up of Electrochemical Reactors

Effect of a net on the limiting current distribution in a parallel plate electrochemical reactor: part I. Individual effects

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