Parameter-Correlation and Computational Considerations in Multiple-Angle Ellipsometry*

Ibrahim, M.M.; Bashara, N. M.

doi:10.1364/josa.61.001622

Cited by 85 publications

(32 citation statements)

References 7 publications

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“…38 To overcome this problem, it can be noted that the light phase, δ, in Eq. (17) depends mainly on two parameters: the incident angle, θ (angle-dependent), [53][54][55] and the layer thickness, d (thickness-dependent). 54 This means Eq.…”

Section: Case Study: Lao/sto Heterostructurementioning

confidence: 99%

Self-consistent iteration procedure in analyzing reflectivity and spectroscopic ellipsometry data of multilayered materials and their interfaces

Asmara

Santoso

Rusydi

2014

Review of Scientific Instruments

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For multilayered materials, reflectivity depends on the complex dielectric function of all the constituent layers, and a detailed analysis is required to separate them. Furthermore, for some cases, new quantum states can occur at the interface which may change the optical properties of the material. In this paper, we discuss various aspects of such analysis, and present a self-consistent iteration procedure, a versatile method to extract and separate the complex dielectric function of each individual layer of a multilayered system. As a case study, we apply this method to LaAlO3/SrTiO3 heterostructure in which we are able to separate the effects of the interface from the LaAlO3 film and the SrTiO3 substrate. Our method can be applied to other complex multilayered systems with various numbers of layers.

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Section: Case Study: Lao/sto Heterostructurementioning

confidence: 99%

Self-consistent iteration procedure in analyzing reflectivity and spectroscopic ellipsometry data of multilayered materials and their interfaces

Asmara

Santoso

Rusydi

2014

Review of Scientific Instruments

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“…In forward-calculations methods, the calculations start with the unknown value which is to be determined to calculate a known measured quantity, or a minimized function thereof. 11 The starting value of the unknown which is to determine is then changed and forward calculations repeated until a calculated value of the measured parameter coincides closely with the actual measured value, or its associated minimized function. The starting value of the unknown quantity in this case is the solution chased.…”

Section: Data Reductionmentioning

confidence: 99%

Single-angle-of-incidence single-element rotating-polarizer (Single SERP) ellipsometer for film-substrate systems

Zaghloul

2013

SPIE Proceedings

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The single-element rotating-polarizer ellipsometer is where a rotating polarizer is inserted into the incident beam and the reflected-signal intensity is detected using a photodetector. The polarizer is either rotated mechanically or electromagnetically. The angle of incidence of the beam is adjusted to detect the angles where the detector signal is dc. The ellipsometric function of the film-substrate system under measurement is of a unity magnitude at those detected angle(s). The number of required measurements (such angles of incidence) is related (directly proportional) to the number of system parameters to be determined: film thickness is one parameter, film optical constant is two parameters, and substrate optical constant is two parameters. The more parameters to be determined, the more the number of measurements required. This creates film-thickness bands, which number and width depend on the system physical properties and the wavelength used for measurement, and where a continuum exists above a certain film-thickness value. Accordingly, full characterization of film-substrate systems is limited to systems with large film thicknesses for the required multiple angles of incidence to exist. In this paper, we use only one detected angle of incidence to fully characterize the film-substrate system. This allows for film-substrate systems with much smaller film thicknesses to be fully characterized. A fast genetic algorithm is used to heuristically obtain all the system parameters: film thickness and optical constants of the film and the substrate, or any subset thereof.

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“…6,7 In many cases, fitting routines are used to extract the system parameters from the measured quantities. 8 Several numerical inversion methods also exist. [9][10][11][12] Some closed-form formulas exist in the literature that provide the system parameters in a direct way of calculations.…”

Section: Introductionmentioning

confidence: 99%

X-measuring ellipsometer (XME): a novel ellipsometric technique to fully characterize film-substrate systems

Zaghloul

2006

SPIE Proceedings

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We discuss the X-measuring ellipsometer which measures the film-thickness exponential function of a film-substrate system: detecting two conditions on X. It works for all types of film-substrate systems: negative, zero, and positive. Only the transparent zero film-substrate system is discussed in detail. We present more than one ellipsometric configuration to implement the technique. We also present the inversion procedure to obtain the optical constants of the film and the substrate, in addition to the film thickness. Closed-form formulas to obtain the film thickness; the film thickness and its multiplicity; or the film thickness, its multiplicity, and the film and substrate optical constants using one, two, or three measurements, respectively. The instrument is versatile, accurate, fast, and is easily automated. The measurement multiplicity as related to the film thickness, and the permissible-thickness bands and forbidden-thickness gaps are briefly presented and discussed.

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Parameter-Correlation and Computational Considerations in Multiple-Angle Ellipsometry*

Cited by 85 publications

References 7 publications

Self-consistent iteration procedure in analyzing reflectivity and spectroscopic ellipsometry data of multilayered materials and their interfaces

Self-consistent iteration procedure in analyzing reflectivity and spectroscopic ellipsometry data of multilayered materials and their interfaces

Single-angle-of-incidence single-element rotating-polarizer (Single SERP) ellipsometer for film-substrate systems

X-measuring ellipsometer (XME): a novel ellipsometric technique to fully characterize film-substrate systems

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