Particle Removal Efficiency and Damage Analysis on Silicon Wafers after Megasonic Cleaning in Solvents

Barbagini, Francesca; Halder, Sandip; Janssens, Tom; Kenis, Karine; Bearda, Twan; Quoc, Toan-Le; Leunissen, Peter; Mertens, Paul; Kim, Kyung-Hyun; Andreas, Michael

doi:10.1163/016942409x12459095670430

Cited by 5 publications

(2 citation statements)

References 9 publications

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“…Nowadays, research has been performed by controlling the sign of zeta potential to meet this need. But all these are qualitative results . The quantitative relationship between particle adsorption and zeta potential has not been reported.…”

Section: Introductionmentioning

confidence: 99%

The quantitative description between zeta potential and fluorescent particle adsorption on Cu surface

Mei

2013

Surface & Interface Analysis

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The influence factor for polystyrene based fluorescent particles' adsorption on Cu surface in liquid environment was investigated. The fluorescent particles with a size of 100 nm were used as the adsorbing particle for avoiding the disturbance to the adsorption result. The contrast between the fluorescent image and SEM image showed that there was a one‐to‐one correspondence between the fluorescent spot and the particle. This revealed the method of counting the fluorescent spot to obtain the adsorbing particle result is accurate. Zeta potential and ionic strength would affect the value of electrical double layer force. And the electrical double layer force and Van der Waals force between particles and surface determined the behavior of particles when particles got close to Cu surface. Results showed that particle adsorption on Cu surface was linear to the multiply of zeta potential for particles and Cu surface. Also, the influence of ionic strength on fluorescent particle adsorption was investigated. Finally, the quantitative description between zeta potential, ionic strength and particle adsorption was given. Copyright © 2013 John Wiley & Sons, Ltd.

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Section: Introductionmentioning

confidence: 99%

The quantitative description between zeta potential and fluorescent particle adsorption on Cu surface

Mei

2013

Surface & Interface Analysis

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“…9 From the use of traditional ammonia-peroxide mixture (APM) 1 for particle removal to chemistries employing salts, dissolved gases, surfactants and solvents have been discussed in detail by researchers till date. [5][6][7][8] Keswani et al 8 have shown that the presence of a simple electrolyte such as KCl could enhance PRE in a megasonic field. This enhancement in PRE was attributed to a combined effect of electroacoustic forces and increased cavitation generated due to the propagation of sound waves in an ionic solution.…”

mentioning

confidence: 99%

A Sono-Electrochemical Technique for Enhanced Particle Removal from Tantalum Surfaces

Balachandran

Deymier

Raghavan

et al. 2014

ECS Solid State Letters

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Low power megasonics is of interest to semiconductor cleaning community due to minimal feature damage. In this work, megasonic field at low power density in conjunction with electrochemistry is used for enhanced removal of silica particles from tantalum wafers. Cleaning studies were conducted in air or argon saturated aqueous solutions at 0.5 W/cm 2 in the absence and presence of applied potentials of −1.5 V or −2.0 V to tantalum (vs Ag/AgCl). The improvement in particle removal efficiency is attributed to oscillating hydrogen bubbles formed from water reduction in vicinity of tantalum surface and grown to a resonant size under suitable acoustic conditions.

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Use of Surfactants in Acoustic Cleaning

Thanu¹,

Antoniswamy²,

Swaminathan³

et al. 2022

Surfactants in Precision Cleaning

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Particle Removal Efficiency and Damage Analysis on Silicon Wafers after Megasonic Cleaning in Solvents

Cited by 5 publications

References 9 publications

The quantitative description between zeta potential and fluorescent particle adsorption on Cu surface

The quantitative description between zeta potential and fluorescent particle adsorption on Cu surface

A Sono-Electrochemical Technique for Enhanced Particle Removal from Tantalum Surfaces

Use of Surfactants in Acoustic Cleaning

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