2012
DOI: 10.1117/12.920406
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Passivation of type II InAs/GaSb superlattice photodetectors with atomic layer deposited Al<sub>2</sub>O<sub>3</sub>

Abstract: We have achieved significant improvement in the electrical performance of the InAs/GaSb midwave infrared photodetector (MWIR) by using atomic layer deposited (ALD) aluminium oxide (Al 2 O 3 ) as a passivation layer. Plasma free and low operation temperature with uniform coating of ALD technique leads to a conformal and defect free coverage on the side walls. This conformal coverage of rough surfaces also satisfies dangling bonds more efficiently while eliminating metal oxides in a self cleaning process of the … Show more

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Cited by 8 publications
(1 citation statement)
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“…Surface leakage currents mostly originate from surface states due to dangling bonds, inversion layers and interfacial traps which are generated due to the abrupt termination of the crystal structure. Various passivation methods such as sulfide passivation [1], dielectric layer deposition [2,3], overgrowth with wide bandgap materials [4], polymer film coating [5] have been proposed to overcome these problems. Sulphur passivation is an effective passivation method and is easy to apply but the effect of passivation is temporary making it impractical [6].…”
Section: Introductionmentioning
confidence: 99%
“…Surface leakage currents mostly originate from surface states due to dangling bonds, inversion layers and interfacial traps which are generated due to the abrupt termination of the crystal structure. Various passivation methods such as sulfide passivation [1], dielectric layer deposition [2,3], overgrowth with wide bandgap materials [4], polymer film coating [5] have been proposed to overcome these problems. Sulphur passivation is an effective passivation method and is easy to apply but the effect of passivation is temporary making it impractical [6].…”
Section: Introductionmentioning
confidence: 99%