Pattern-integrated interference lithography: Vector modeling and 1D, 2D, and 3D device structures

Modeling of multiple-optical-axis pattern-integrated interference lithography systems

“…With the demand for increasingly smaller components and devices permeating human existence, Pattern-Integrated Interference Lithography (PIIL), was first developed in the Georgia Tech Optics Laboratory in 2012 as a technique to produce, in a rapid, singlestep, interference patterns with integrated functional elements in one, two, and three dimensions [1][2][3][4][5][6][7][8][9][10]. This technique was developed for use in the specific application areas of mirco-and nano-electronics [1,[11][12][13][14], photonic crystals [1,[15][16][17][18][19][20][21][22][23][24], and biomedical structures [1,20,[25][26][27][28][29][30] based upon other interference lithography (IL) techniques that had been used for these applications.…”

“…This technique was developed for use in the specific application areas of mirco-and nano-electronics [1,[11][12][13][14], photonic crystals [1,[15][16][17][18][19][20][21][22][23][24], and biomedical structures [1,20,[25][26][27][28][29][30] based upon other interference lithography (IL) techniques that had been used for these applications. While a prototype system in a single-optical-axis (SOA) configuration has been experimentally demonstrated as a proof-of-concept, PIIL systems are still in a research and development stage [1][2][3][4][5][6][7][8][9][10].…”

“…technologies, Pattern-Integrated Interference Lithography (PIIL) was introduced by the Georgia Tech Optics Laboratory to fulfill this perceived deficiency [1][2][3][4][5][6][7][8][9][10].…”

“…Since each axis is only accommodating a single beam, the optical elements in an MOA configuration may be significantly smaller than an SOA configuration. Additionally, while a single mask in an SOA configuration is easier to align and less sensitive to adjustments, an MOA configuration involves multiple masks which can generate a wider variety of selectively modified interference motifs [6,8,9].…”

“…Interference Lithography (PIIL), first developed in the Georgia Tech Optics Laboratory in 2012, provides an attractive option for a variety of applications as it can produce in a single-step, interference patterns with integrated functional elements in one, two, and three dimensions [1][2][3][4][5][6][7][8][9][10]. While a prototype system in a single-optical-axis (SOA) configuration has been experimentally demonstrated as a proof-of-concept, PIIL systems are still in a research and development stage [1][2][3][4][5][6][7][8][9][10].…”