This abstract is for oral presentation.Carbon nanotube (CNT) thin films are promising electronic materials for a wide range of applications, such as large area transparent and flexible electronics [1], supercapacitors [2], and solar cells [3]. Because the electrical response of a random network of CNTs is determined by percolation of both metallic and semiconducting CNTs, the density of the CNTs determines the electrical behavior of a CNT thin film [4]. Thus, it is possible to realize different CNT-device components by controlling the density. In addition, it is essential to pattern CNT thin films to define individual device components. However, different applications require different patterning approaches. For large area integrated circuits, CNT thin films must be patterned with high resolution and low edge roughness. For flexible electronics on plastic substrates, the patterned CNT thin films must be compatible with additional fabrication steps such as transfer printing. To probe the intrinsic physical properties of CNTs, as-grown CNT thin film patterns are desired without any chemical exposure. Finally, to fully realize the potential of CNT thin film as electronic materials in flexible electronics, patterned CNT thin films have to be placed onto different substrates. Here, we report on controlled growth, patterning, and placement methods that meet these requirements.Chemical vapor deposition (CVD) was used to grow CNT thin films. The density of CNTs was controlled by systematically varying the density of catalyst nanoparticles (ferric nitrate) on the thermally oxidized Si growth substrate. The resulting CNT thin films had densities ranging from ~ 5 CNTs/100 m 2 to ~ 300 CNTs/100 m 2 (Fig. 1).Initially the CNT thin films can be patterned in two ways. In the first method, CNTs are grown from pre-patterned catalyst particles. In the second method, CNT thin films are patterned by photolithography after the growth. In the first case, CNTs pattern remain pristine, but the edge roughness of patterns is determined by length of CNTs (~ 10 m). In the second case, a good edge roughness (< 1 m) is achieved, but CNTs are exposed to processing chemicals. The disadvantages of these two approaches can be avoided by patterning CNT thin film using an alternative approach.We used transfer printing approach to pattern as-grown CNT thin films. This was achieved by selectively transfer printing CNTs from the growth substrate to thermoplastic (polyterephthalate) or metallic (Au) stamps, see Fig. 2(a) and (b). Fig. 2 (c) shows parallel arrays of CNT thin films patterned by using Au stamps. These pristine CNT thin film patterns have high resolution (up to 5 m), low edge roughness (~ 1 m).We employed transfer printing methods to place patterned CNT thin films on different substrates. High quality CNT thin film transistors (TFT) were fabricated on PET substrates, incorporating poly(methyl methacrylate) as the gate dielectric and Au as the electrode material. CNT TFTs were demonstrated with field effect mobility up to 20 cm 2 /Vs with o...