Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography

Abstract

Arrays of nanodots were directly patterned by interferometric lithography using a bright table-top 46.9 nm laser. Multiple exposures with a Lloyd's mirror interferometer allowed to print arrays of 60 nm FWHM features. This laser-based extreme ultraviolet interferometric technique makes possible to print different nanoscale patterns using a compact tabletop set up.

Nanopatterning in a compact setup using table top extreme ultraviolet lasers

“…6(b) shows the details of the measured profile of the small pillars with FWHM~58 nm and the period 153 nm. The height of the cones and the depth of the holes pattern correspond to the penetration depth of the 46.9 nm photons in the PMMA photoresist, approximately 30 nm [23].…”

Extreme ultraviolet lithography with table top lasers

“…Table top EUV lasers in combination with a Lloyd's interferometer were also used to print lines and two dimensional arrays of holes and pillars in different photoresists [51,[80][81][82]. Both beams converge at the edge of the mirror on the sample to give rise to a sinusoidal intensity pattern of period d, defined by the wavelength of the light l and the incidence angle y according to Eq.…”

“…All the patterns shown in Figs. 5 and 6 were obtained with typical exposure times of 1-2 min [81,82,85].…”

Imaging and Patterning on Nanometer Scale Using Coherent EUV Light

“…Patterning of sub-60 nm features in the photoresist surface using coherent EUV light produced by the capillary discharge laser was realized utilizing an IL technique [13]. The IL technique was implemented by illuminating a flat mirror in the Lloyd configuration with the EUV laser output.…”