2012
DOI: 10.1016/j.tsf.2011.07.007
|View full text |Cite
|
Sign up to set email alerts
|

Patterning of porous silicon nanostructures and eliminating microcracks on silicon nitride mask using metal assisted chemical etching

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
3
0

Year Published

2014
2014
2023
2023

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 7 publications
(3 citation statements)
references
References 28 publications
0
3
0
Order By: Relevance
“…12b have also been produced using the Pd-catalyst etching technique by several authors. [9][10][11][12][13][14] We also measured the optical transmittance and PL spectra of the Pd-etched Si sample in the HF/H 2 O 2 solution (Fig. 12b) and found to show almost the same spectra as those for the porous columnar samples formed in the NH 4 HF 2 /H 2 O 2 solutions [Fig.…”
Section: Etching In Hf/h 2 O 2 Solutionmentioning
confidence: 98%
See 1 more Smart Citation
“…12b have also been produced using the Pd-catalyst etching technique by several authors. [9][10][11][12][13][14] We also measured the optical transmittance and PL spectra of the Pd-etched Si sample in the HF/H 2 O 2 solution (Fig. 12b) and found to show almost the same spectra as those for the porous columnar samples formed in the NH 4 HF 2 /H 2 O 2 solutions [Fig.…”
Section: Etching In Hf/h 2 O 2 Solutionmentioning
confidence: 98%
“…8 However, a few studies were performed on chemical etching of Si wafers using Pd as the catalyst. [9][10][11][12][13][14] These studies reported a formation of the porous layers, which had morphologies the same as those popularly formed by anodic etching, stain etching, or photoetching (Ref. 15).…”
mentioning
confidence: 91%
“…Previous reports have used either n-type silicon with photomasks to define the etch regions 34 or through patterning the silicon wafer first using various masking techniques. 35,36 Alternative approaches using chemistry have been employed recently to pattern PSi. For instance, Gooding and colleagues recently developed a multistep approach to pattern chemically modified PSi using photolithography and demonstrated the applicability for cell microarrays with an optical read-out.…”
mentioning
confidence: 99%