2019 IEEE 32nd International Conference on Microelectronic Test Structures (ICMTS) 2019
DOI: 10.1109/icmts.2019.8730956
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PbS Quantum Dot / ZnO Nanowires Hybrid Test Structures for Infrared Photodetector

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Cited by 7 publications
(3 citation statements)
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“…It can be seen from previous literature reports that in the vertical structure devices (Si–ZnO–PbS–Au), the devices irradiated from the Si side (back) only show weak light responsivity in the NIR region, and there is no obvious light response in the UV–Vis band. However, when the device is irradiated from the Au side (front), the device can show broadband spectral response. This result shows that when light irradiates the silicon substrate from the back, it will first reflect some photons, and then absorb and filter out the photons in the Vis region, thus reducing the absorption and utilization of photons by the device, as shown in Figure d. Therefore, the preparation of device structures that can be directly irradiated on materials is very innovative and positive.…”
Section: Resultsmentioning
confidence: 99%
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“…It can be seen from previous literature reports that in the vertical structure devices (Si–ZnO–PbS–Au), the devices irradiated from the Si side (back) only show weak light responsivity in the NIR region, and there is no obvious light response in the UV–Vis band. However, when the device is irradiated from the Au side (front), the device can show broadband spectral response. This result shows that when light irradiates the silicon substrate from the back, it will first reflect some photons, and then absorb and filter out the photons in the Vis region, thus reducing the absorption and utilization of photons by the device, as shown in Figure d. Therefore, the preparation of device structures that can be directly irradiated on materials is very innovative and positive.…”
Section: Resultsmentioning
confidence: 99%
“…We fabricated ZnO NWs/PbS QDs optoelectronic devices with an interdigitated electrode structure to maximize the utilization of photon energy. And the semiconductor material will not be covered by the interdigitated electrodes, so there is no need to worry about the damage to the semiconductor film caused by the deposition of the electrode, and the beam can be directly irradiated on the semiconductor material, avoiding the substrate reflection and absorption loss caused by back lighting. …”
Section: Introductionmentioning
confidence: 99%
“…To improve the performance, a thin ZnO layer as a carrier collection layer was inserted between PbS/Si interface [13], [18], [19]. As a result, the carrier collection at the wavelength of 1.33 µm was higher than that at a PbS CQDs/Si heterojunction; however, the efficiency was still considerably lower than that obtained in previous studies [19] as well as that of the PbS/ZnO/F-doped tin oxide (FTO) device [20]. To investigate the cause of low current, we developed a test structure [21].…”
Section: Introductionmentioning
confidence: 87%