Periodically Structured Glancing Angle Deposition Thin Films

Jensen, Martin O.; Brett, Michael

doi:10.1109/tnano.2004.842061

Cited by 91 publications

(49 citation statements)

References 27 publications

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“…If w S is oversized in relation to the equilibrium structure diameter found on unpatterned substrates, multi-structure growth on every artificial seed is likely to occur [13,21]. If, however, the seed diameter w S is chosen to be within the range of the equilibrium structure diameter (it has to be taken into account that especially for columnar structures, w is dependent on the actual height of the structure [25]), multi-columnar growth (i.e., the survival of more than one structure per seed) on single seeds can be avoided, and only one structure will grow on every seed [29,30]. Apart from that, w S influences the diameter w of the structures growing on the artificial seeds by setting a downward limit for w. Figures 9(a) and (b) show four-fold spirals grown on tetragonally patterned substrates with comparable template periods d ¼ 690 and 800 nm, but different seed diameters w S ¼ 155 and 260 nm.…”

Section: Influence Of Seed Diametermentioning

confidence: 99%

Periodically arranged Si nanostructures by glancing angle deposition on patterned substrates

Patzig

Khare

Fuhrmann

et al. 2010

Physica Status Solidi (b)

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Using glancing angle deposition (GLAD) by ion beam sputtering of Si on differently patterned substrates, periodically arranged Si nanostructures were obtained. Patterns with tetragonal, honeycomb-like, and hexagonally closed packed (hcp) arrangement of the artificial seeds for the subsequent deposition at oblique particle incidence were used to demostrate the influence of the pattern periodicity, the inter-seed distances, and other deposition parameters on the growth and morphological evolution of the Si nanostructures.Cross-sectional scanning electron microscopy micrograph of periodically arranged Si nanospirals deposited on a tetragonally arranged template pattern.

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Section: Influence Of Seed Diametermentioning

confidence: 99%

Periodically arranged Si nanostructures by glancing angle deposition on patterned substrates

Patzig

Khare

Fuhrmann

et al. 2010

Physica Status Solidi (b)

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“…By applying a voltage between a force microscope tip and a sample, electrostatic force microscopy [1] (EFM) has succeded in the analysis of different materials [2], [3], [4], [5], [6], [7] at the nanoscale. However, the understanding and simulation of the tip-sample interaction requires a great effort for the users due to the long-range nature of the electrostatic force.…”

Section: mentioning

confidence: 99%

Influence of the Substrate and Tip Shape on the Characterization of Thin Films by Electrostatic Force Microscopy

Sacha

2013

IEEE Trans. Nanotechnology

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Esta es la versión de autor del artículo publicado en: This is an author produced version of a paper published in: G. M. SachaAbstract-Electrostatic force microscopy has been shown to be a useful tool to determine the dielectric constant of nanoscaled thin films that play a key role in many electrical, optical and biological phenomena. Previous approaches have made use of simple analytical models to analyze the experimental data for these materials. Here we show that the electrostatic force shows a completely different behavior when the shape of the tip and sample are taken into account. We present a complete study of the interaction between the whole tip and the layers below the thin film. We demonstrate that physical magnitudes such as the surface charge density distribution and the size of the materials have a strong influence on the EFM signal. The EFM sensitivity to the substrate below the thin film decreases with the substrate thickness and saturates for thicknesses above two times the length of the tip, when it is close to that of an infinite medium.

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“…In 2013, Mark et al [5] employed an extremely low substrate temperature of approximately −140 • C to obliquely deposit gold nanohelices with pitch lengths of only 34 nm on a seeded surface. The low substrate temperature was required to reduce the diffusion energy of deposited atoms, and the seeds on the surface were arranged to offer a shadowing effect [6]. However, expensive lithography is required to pattern the seeded surface of the substrate [7].…”

Section: Introductionmentioning

confidence: 99%

The Effect of Glancing Angle Deposition Conditions on the Morphology of a Silver Nanohelix Array

et al. 2017

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Silver nanohelices were grown on smooth substrates using glancing angle deposition and substrate cooling. Various nanohelix arrays were deposited under different deposition conditions-different deposition rates, substrate spin rates, deposition angles, and substrate temperatures. The effect of deposition conditions on the morphology of each nanohelix array in terms of pitch angle, pitch length, wire diameter, and radius of curvature was investigated. The dependence of circular dichroism on the size of the nanohelix arrays was also measured and demonstrated.

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Periodically Structured Glancing Angle Deposition Thin Films

Cited by 91 publications

References 27 publications

Periodically arranged Si nanostructures by glancing angle deposition on patterned substrates

Periodically arranged Si nanostructures by glancing angle deposition on patterned substrates

Influence of the Substrate and Tip Shape on the Characterization of Thin Films by Electrostatic Force Microscopy

The Effect of Glancing Angle Deposition Conditions on the Morphology of a Silver Nanohelix Array

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