2014
DOI: 10.1016/j.surfcoat.2014.01.043
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Photo-initiated chemical vapor deposition of thin films using syngas for the functionalization of surfaces at room temperature and near-atmospheric pressure

Abstract: , J. R. (2014). Photo-initiated chemical vapor deposition of thin films using syngas for the functionalization of surfaces at room temperature and near-atmospheric pressure. Surface and Coatings Technology, 244, p. 98-108. doi:10.1016/j.surfcoat.2014 This study addresses the current limiting factor, namely the cost issue, by using simple gas precursors, using an a↵ordable initiation source and operating under normal condition. This approach di↵ers from the current approaches which use expensive solvents as pr… Show more

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Cited by 25 publications
(44 citation statements)
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“…An optimal set of parameters was identified following a detailed design of experiment, with the H 2 /CO ratio varying from 1/12 to 1, the pressure varying from 86 kPa to atmospheric (101 kPa), the sample position varying from 2.5 to 30 cm from the gas inlet and the Further, the island-like deposition observed by AFM is consistent with previous electronmicroscopy findings on PICVD treated copper substrates. 48 Save for a few punctual observations, no significant roughness difference is observed between untreated surfaces and UV-ozone treated surfaces. On the other side, the randomly dispersed larger grains identified with yellow arrows in Figure 2 are similar to features observed in previous studies on polystyrene treated with UV and ozone, 34,[59][60] which are associated with loosely bonded fragments inherent to the oxidation effect of ozone.…”
Section: Resultsmentioning
confidence: 94%
See 1 more Smart Citation
“…An optimal set of parameters was identified following a detailed design of experiment, with the H 2 /CO ratio varying from 1/12 to 1, the pressure varying from 86 kPa to atmospheric (101 kPa), the sample position varying from 2.5 to 30 cm from the gas inlet and the Further, the island-like deposition observed by AFM is consistent with previous electronmicroscopy findings on PICVD treated copper substrates. 48 Save for a few punctual observations, no significant roughness difference is observed between untreated surfaces and UV-ozone treated surfaces. On the other side, the randomly dispersed larger grains identified with yellow arrows in Figure 2 are similar to features observed in previous studies on polystyrene treated with UV and ozone, 34,[59][60] which are associated with loosely bonded fragments inherent to the oxidation effect of ozone.…”
Section: Resultsmentioning
confidence: 94%
“…47 We thus expect treated beads to remain stable in suspension without additives, thus enabling automated detection after container swirling over extended periods. Radical polymerization of syngas initiated by UVC radiation has already been tested on copper, 48 polypropylene and polyethylene terephthalate 49 , nanocrystalline cellulose 50 , superparamagnetic iron oxide nanoparticles 51 and metal oxide nanoparticles 52 substrates with success.…”
Section: Introductionmentioning
confidence: 99%
“…Previously, our group studied the chemistry of syngas photo-initiated chemical vapor deposition (PICVD) on flat surfaces 40 , 41 , 52 and on particulates in a plug-flow configuration 42 , 53 55 . Herein, we adapt this process for use in a sub-pilot scale jet-assisted fluidized bed reactor (FB-PICVD) to coat large quantities of MIONPs (grams) in order to improve their dispersion and stability in non-polar (hydrophobic) media.…”
Section: Introductionmentioning
confidence: 99%
“…Dion et al 40 presented a statistical model for the PICVD treatment of copper with a similar experimental design. The major contributing factors to the model were position and syngas ratio.…”
Section: Resultsmentioning
confidence: 99%
“…The line was connected to a three-way valve leading to vacuum to test sub atmospheric pressures. For further details, see Dion et al 40 . The factors tested to functionalize the polymer surfaces included time, pressure, H 2 /CO (syngas) ratio, photo initiator feed rate (H 2 O 2 ) as well as sample position in the reactor (3 to 87 cm from the inlet).…”
Section: Methodsmentioning
confidence: 99%