“…In this paper, we study such a film, a self-assembled monolayer (SAM) that uses thiol anchors to bind to metal surfaces, and contains the well-known photo-sensitive onitrobenzyl (oNB) group [10][11][12][13][14][15][16][17][18][19] that cleaves on photoactivation to release a specific chemical moiety, in our case a primary amine. SAMs containing this ligand have been studied in the past, although the bulk of the work has been done on SiO2 and similar surfaces, using silanes to bond to the surface, 10,14,16,17,[20][21][22][23] with a smaller number of papers concerned with thiolbound SAMs. 11,12,19,24 While oNB is the most heavily studied photocleavable protecting group, a number of other moieties with similar properties are also in use.…”