2007
DOI: 10.1070/qe2007v037n11abeh013515
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Photoinduced laser etching of a diamond surface

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Cited by 42 publications
(28 citation statements)
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“…The two-photon dependence, along with a lack of threshold, is indicative of a material ejection mechanism intrinsically different from usual laser ablation and desorption which rely upon thermal-or plasma-mediated ejection mechanisms. The process is also distinguished from laser ablation of diamond by the absence of graphite formation on the treated surface 18,19 .…”
mentioning
confidence: 99%
“…The two-photon dependence, along with a lack of threshold, is indicative of a material ejection mechanism intrinsically different from usual laser ablation and desorption which rely upon thermal-or plasma-mediated ejection mechanisms. The process is also distinguished from laser ablation of diamond by the absence of graphite formation on the treated surface 18,19 .…”
mentioning
confidence: 99%
“…The depth of the crater is only about 30 nm, which is less than the 150 nm film thickness. This is a new example of pulsed laser induced surface oxidation (nanoablation), which was earlier observed for non-conductive diamond samples [13,14]. The average etching rate is only 0.03 nm/pulse, which allows application of a nanoablation process M A N U S C R I P T ACCEPTED MANUSCRIPT 8 for ultra-precise film nanostructuring.…”
Section: Accepted Manuscriptmentioning
confidence: 94%
“…However, this approach is less developed but under intensive study for diamond films [11,12]. For example, recently it has been demonstrated that laser nanoablation is an effective technique for ultra precise removal of single, poly and nanocrystalline (all non-conductive) diamond samples, which are irradiated in air [13,14]. In this work, we present a new technique for laser induced nanostructuring of CNCD films which manifests itself at laser pulse intensities below the laser nanoablation threshold.…”
Section: Accepted Manuscriptmentioning
confidence: 96%
“…The details of the UV absorption in the surface layers and subsequent ejection kinetics are not well understood. A separate group had previously seen signs of this effect (Kononenko et al 2007) and reported that the presence of oxygen is required for etching. An improved understanding of the mechanism is needed to determine how the etching can be prevented or exploited.…”
mentioning
confidence: 99%