Planar metalenses in the mid-infrared

Wang, Ang; Chen, Zhemin; Dan, Yaping

doi:10.1063/1.5124074

Cited by 24 publications

(21 citation statements)

References 23 publications

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“…iScience Review the view point of lower aspect ratio and high producibility in fabrication compared with the dielectric material (Liang et al, 2019) Both refractive index and absorption coefficient vary with wavelength, so the most suitable dielectric material is determined by the wavelength range in which the lens is to be used (Liang et al, 2019). For example, germanium (Ge) and silicon (Si) are suitable for use in the infrared band (Wang et al, 2019(Wang et al, , 2020a, titanium dioxide (TiO 2 ) and gallium nitride (GaN) are suitable for the visible band (Khorasaninejad et al, 2017a;Huang et al, 2020), and hafnium oxide (HfO 2 ) and aluminum nitride (AlN) are suitable for the UV band (Zhang et al, 2020a;Guo et al, 2018).…”

Section: Metalens Designmentioning

confidence: 99%

Recent Progress on Ultrathin Metalenses for Flat Optics

et al. 2020

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As technology advances, electrical devices such as smartphones have become more and more compact, leading to a demand for the continuous miniaturization of optical components. Metalenses, ultrathin flat optical elements composed of metasurfaces consisting of arrays of subwavelength optical antennas, provide a method of meeting those requirements. Moreover, metalenses have many other distinctive advantages including aberration correction, active tunability, and semi-transparency, compared to their conventional refractive and diffractive counterparts. Therefore, over the last decade, great effort has been focused on developing metalenses to investigate and broaden the capabilities of metalenses for integration into future applications. Here, we discuss recent progress on metalenses including their basic design principles and notable characteristics such as aberration correction, tunability, and multifunctionality.

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Section: Metalens Designmentioning

confidence: 99%

Recent Progress on Ultrathin Metalenses for Flat Optics

et al. 2020

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“…The slight difference can be contributed to the fact that theoretical calculations assume perfect phase distributions and uniform amplitude. Since the designed metalens is a one-dimensional focusing lens, both theoretical and simulated radiuses are smaller than diffraction-limit (λ/2NA = 10.6 μm, NA = 0.5 is the numerical aperture) 46,47 . However, the YLP incidence is not allowed to be transmitted by the designed metalens, as shown in Fig.…”

Section: The Design Of Deflector and Metalensmentioning

confidence: 99%

Simultaneous polarization filtering and wavefront shaping enabled by localized polarization-selective interference

Cai¹,

Zhang²,

Zhang³

et al. 2020

Sci Rep

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The ability of simultaneous polarization filter and wavefront shaping is very important for many applications, especially for polarization imaging. However, traditional methods rely on complex combinations of bulky optical components, which not only hinder the miniaturization and integration but also reduce the efficiency and imaging quality. Metasurfaces have shown extraordinary electromagnetic properties to manipulate the amplitude, polarization, and wavefront. Unfortunately, multi-layer metasurfaces with complex fabrication are often required to realize complex functions. Here, a platform of monolayer all-dielectric metasurfaces is proposed to simultaneously achieve polarization filtering and wavefront shaping, based on the principle of local polarization-selective constructive or destructive interference. The transmission efficiency surpassing 0.75 and polarization extinction ratio exceeding 11.6 dB are achieved by the proposed metasurface at the wavelength of 10.6 μm. These results are comparable to those of multi-layer metasurfaces. Considering these good performances, this work may prove new ideas for the generation of complex optical field and find wide applications in polarization imaging.

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“…EBL consists of patterning the desired shape directly on the negative or positive resist with a Gaussian electron beam with a diameter in the angstrom scale. However, this technique cannot be applied to low-cost and large-area manufacturing because the transfer of the full pattern onto the resist requires longer processing times (the beam is focused on a single point of pattern at a time), implying high operating costs [5,17,[25][26][27][28][29].…”

Section: Introductionmentioning

confidence: 99%

Silicon Metalens Fabrication from Electron Beam to UV-Nanoimprint Lithography

et al. 2021

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This study presents the design and manufacture of metasurface lenses optimized for focusing light with 1.55 µm wavelength. The lenses are fabricated on silicon substrates using electron beam lithography, ultraviolet-nanoimprint lithography and cryogenic deep reactive-ion etching techniques. The designed metasurface makes use of the geometrical phase principle and consists of rectangular pillars with target dimensions of height h = 1200 nm, width w = 230 nm, length l = 354 nm and periodicity p = 835 nm. The simulated efficiency of the lens is 60%, while the master lenses obtained by using electron beam lithography are found to have an efficiency of 45%. The lenses subsequently fabricated via nanoimprint are characterized by an efficiency of 6%; the low efficiency is mainly attributed to the rounding of the rectangular nanostructures during the pattern transfer processes from the resist to silicon due to the presence of a thicker residual layer.

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Planar metalenses in the mid-infrared

Cited by 24 publications

References 23 publications

Recent Progress on Ultrathin Metalenses for Flat Optics

Recent Progress on Ultrathin Metalenses for Flat Optics

Simultaneous polarization filtering and wavefront shaping enabled by localized polarization-selective interference

Silicon Metalens Fabrication from Electron Beam to UV-Nanoimprint Lithography

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