2018
DOI: 10.3367/ufnr.2018.06.038447
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Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

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Cited by 12 publications
(5 citation statements)
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“…Currently, a radiation source at a wavelength of 13.5 nm [15] is being developed on the basis of the tin emission line. The task of maximum collection of such radiation is urgent.…”
Section: Stock Mirrors Mo/be and Mo/si With Spectral Bandwidth Coinci...mentioning
confidence: 99%
“…Currently, a radiation source at a wavelength of 13.5 nm [15] is being developed on the basis of the tin emission line. The task of maximum collection of such radiation is urgent.…”
Section: Stock Mirrors Mo/be and Mo/si With Spectral Bandwidth Coinci...mentioning
confidence: 99%
“…Для успешного развития данных приложений существует потребность в высокоинтенсивных лабораторных источниках мягкого рентгеновского излучения. В настоящее время наиболее удобными по совокупности свойств являются лазерно-плазменные источники излучения (ЛПИ) [4].…”
Section: Introductionunclassified
“…For the successful development of these applications, there is a need for high-intensity laboratory sources of soft X-ray radiation. Currently, the most convenient in terms of the set of properties are laser-plasma radiation sources (LPRS) [4].…”
Section: Introductionmentioning
confidence: 99%