Plasma-enhanced chemical-vapour-deposition of thin films by corona discharge at atmospheric pressure

Thyen, R.; Weber, A.; Klages, Claus‐Peter

doi:10.1016/s0257-8972(97)00158-8

Cited by 105 publications

(81 citation statements)

References 3 publications

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“…Dielectric barrier discharges have been examined for several material processes, including the cleaning of metal surfaces [57] and the plasma-assisted chemical vapor deposition of polymers [56] and glass films [58]. However, since the plasma is not uniform, its use in etching and deposition is limited to cases where the surface need not be smooth.…”

Section: Dielectric Barrier Dischargementioning

confidence: 99%

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The atmospheric-pressure plasma jet: a review and comparison to other plasma sources

Schütze

Jeong

Babayan

et al. 1998

IEEE Trans. Plasma Sci.

1,263

766

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Abstract-Atmospheric-pressure plasmas are used in a variety of materials processes. Traditional sources include transferred arcs, plasma torches, corona discharges, and dielectric barrier discharges. In arcs and torches, the electron and neutral temperatures exceed 3000 C and the densities of charge species range from 10 16 -10 19 cm 03 . Due to the high gas temperature, these plasmas are used primarily in metallurgy. Corona and dielectric barrier discharges produce nonequilibrium plasmas with gas temperatures between 50-400 C and densities of charged species typical of weakly ionized gases. However, since these discharges are nonuniform, their use in materials processing is limited. Recently, an atmospheric-pressure plasma jet has been developed, which exhibits many characteristics of a conventional, low-pressure glow discharge. In the jet, the gas temperature ranges from 25-200 C, charged-particle densities are 10 11 -10 12 cm 03 , and reactive species are present in high concentrations, i.e., 10-100 ppm. Since this source may be scaled to treat large areas, it could be used in applications which have been restricted to vacuum. In this paper, the physics and chemistry of the plasma jet and other atmospheric-pressure sources are reviewed.Index Terms-Atmospheric pressure, corona discharge, dielectric barrier discharge, plasma jet, plasma torch, thermal and nonthermal plasmas, transferred arc.

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Section: Dielectric Barrier Dischargementioning

confidence: 99%

“…However, since the plasma is not uniform, its use in etching and deposition is limited to cases where the surface need not be smooth. For example, in the study of SiO deposition, it was found that the surface roughness exceeded 10% of the film thickness [58].…”

Section: Dielectric Barrier Dischargementioning

confidence: 99%

The atmospheric-pressure plasma jet: a review and comparison to other plasma sources

Schütze

Jeong

Babayan

et al. 1998

IEEE Trans. Plasma Sci.

1,263

766

View full text Add to dashboard Cite

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“…These materials comprise organically modified oxides [210], plasma-polymerized HMDSO coatings [211,212], so-called organically modified ceramics (ORMOCER [213]) and organically modified silicates (ORMOSIL [214]). One could also mention the hydrogenated amorphous carbon coatings [215][216][217], such as those developed by Moser et al that combine ductility and efficient barrier properties [218][219][220]. An alternative to develop new types of defect-tolerant high-barrier thin films could be based on theoretical analyses of mechanical contacts, that lead to optimal coatings with gradient in mechanical properties [221].…”

Section: Defect-tolerant High-barrier Thin Filmsmentioning

confidence: 99%

Durability of nanosized oxygen-barrier coatings on polymers

Leterrier

2003

Progress in Materials Science

472

341

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Research on silicon oxide thin films developed as gas-barrier protection for polymer-based components is reviewed, with attention paid to the relations between (i) coating defects, cohesive strength and internal stress state, and (ii) interfacial interactions and related adhesion to the substrate. The deposition process of the oxide from a vapor or a plasma phase leads in both cases to the formation of covalent bonds between the two materials, with high adhesion levels. The oxide coating contains nanoscopic defects and microscopic flaws, and their respective effect on the barrier performance and mechanical resistance of the coating is analyzed. Potential improvements are discussed, including the control of internal stresses in the coating during deposition. Controlled levels of compressive internal stresses in the coating are beneficial to both the barrier performance and the mechanical reliability of the coated polymer. An optimal coating thickness, with low oxygen permeation and high cohesive strength, is determined from experimental and theoretical analyses of the failure mechanisms of the coating under mechanical load. These investigations are found relevant to tailor the interactions and stress state in the interfacial region, in order to improve the reliability of the coating/substrate assembly. #

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“…An ultrasonic atomic force microscopy (UAFM) are thought to be an advantageous tool for the detection of defects in comparison with a conventional atomic force microscopy (AFM) [3] and scanning electron microscopy (SEM). A cross-sectional high-resolution transmission electron microscopy (TEM) can also serve to detect defects, however, sample making prior to the observation is not easy, which causes damages of the sample during the sample making [4].…”

Section: Introductionmentioning

confidence: 99%

Research on the Characterization and the Properties of SiO<sub>x</sub> Coating on Plastic Film

Zhang

Chen

et al. 2010

AMR

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Abstract. The nano-thickness SiOx deposited on polyethylene terephthalate (PET) film and biaxially oriented polypropylene (BOPP) were fabricated by plasma enhanced chemical vapor deposition (PECVD) in a radio frequency (13.56 MHz) glow discharge. The nano-coatings were characterized by using Fourier transform infrared spectroscopy (FTIR), atomic force microscopy (AFM) and ultrasonic atomic force microscopy (UAFM). With AFM and UAFM, the topography and ultrasonic amplitude images were obtained. In particular, the UAFM images reveal the subsurface defects in the coating. The tensile property, contact angle and OTR of the PET present and absent of the SiOx coating were investigated experimentally respectively. The results can show that the SiOx coating can improved the barrier and the tensile strength.

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Plasma-enhanced chemical-vapour-deposition of thin films by corona discharge at atmospheric pressure

Cited by 105 publications

References 3 publications

The atmospheric-pressure plasma jet: a review and comparison to other plasma sources

The atmospheric-pressure plasma jet: a review and comparison to other plasma sources

Durability of nanosized oxygen-barrier coatings on polymers

Research on the Characterization and the Properties of SiO<sub>x</sub> Coating on Plastic Film

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